Soft magnetic properties of as-deposited Fe-Si-O thin films

被引：1
|
作者：
Yoon, TS
Li, Y
Koo, ES
Kim, CO
机构：
[1] Chungnam Natl Univ, Res Ctr Adv Magnet Mat, Yousung Gu, Taejon 305764, South Korea
[2] Shanghai Univ, Inst Mat, Shanghai 200041, Peoples R China
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2003年 / 254卷
关键词：
soft magnetic properties; thin film; nanocrystalline;
D O I：
10.1016/S0304-8853(02)00919-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The properties of the nanocrystalline as-deposited Fe-Si-O thin films fabricated by RF agnetron reactive sputtering method have been studied. The best magnetic softness obtained from as-deposited Fe79.8Si17.3O2.9 thin films is the saturation flux density of 17.2kG, coercivity of 3.1 Oe and effective permeability of about 1000 at 100 MHz. The electrical resistivity of Fe79.8Si17.3O2.9 thin film is 35 muOmega cm (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：416 / 418
页数：3
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