Lifetime measurement of metastable fluorine atoms using electron cyclotron resonance plasma source

被引:4
作者
Shimizu, Masao
Ohmi, Hiromasa
Kakiuchi, Hiroaki
Yasutake, Kiyoshi
机构
[1] Yasu Semicond Corp, Shiga 5202632, Japan
[2] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2006年 / 24卷 / 06期
关键词
D O I
10.1116/1.2357959
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The authors have measured the lifetime of metastable state (3s(4)P(5/2)) of F atoms by resonant laser-induced fluorescence method. For this experiment, a special 2.45 GHz electron cyclotron resonance (ECR) plasma source, which is highly efficient in F radical generation and free from magnetic field leakage in front of the beam-emitting orifice, has been developed. Using the ECR plasma gun, the authors observed a precision fluorescence spectrum related to 3p D-4(7/2)0(F=4) -> 3s(4)P(5/2)(F = 3) transition of F radicals, which made it possible to experimentally determine the longitudinal velocity distribution and the angular spread of the F radical beam. Based on these measured beam characteristics, the authors extracted a true decay curve of fluorescence intensity as a function of distance from the source and determined the-lifetime of F metastable state (3S (4)p(5/2)) as 7.3 +/- 0.5 mu s. (c) 2006 American Vacuum Society.
引用
收藏
页码:2133 / 2138
页数:6
相关论文
共 29 条
[1]   Optical forces on atoms in nonmonochromatic light [J].
Cashen, M ;
Metcalf, H .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2003, 20 (05) :915-924
[2]   Absolute fluorine atom concentrations in fluorocarbon plasmas determined from CF2 loss kinetics [J].
Cunge, G ;
Chabert, P ;
Booth, JP .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (12) :7750-7755
[3]   EXPERIMENTAL LIFETIMES OF THE 3P AND 3D STATES OF NEUTRAL FLUORINE [J].
DELALIC, Z ;
ERMAN, P ;
KALLNE, E .
ZEITSCHRIFT FUR PHYSIK D-ATOMS MOLECULES AND CLUSTERS, 1990, 17 (02) :87-89
[4]   PARAMETER AND REACTOR DEPENDENCE OF SELECTIVE OXIDE RIE IN CF4+H2 [J].
EPHRATH, LM ;
PETRILLO, EJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (10) :2282-2287
[5]   Optimization and analysis of NF3 in situ chamber cleaning plasmas [J].
Ji, B ;
Yang, JH ;
Badowski, PR ;
Karwacki, EJ .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (08) :4452-4462
[6]  
Johnson AD, 2000, SOLID STATE TECHNOL, V43, P103
[7]   INFLUENCE OF COADSORBED POTASSIUM ON THE ELECTRON-STIMULATED DESORPTION OF F+, F-, AND F-ASTERISK FROM PF3 ON RU(0001) [J].
JOYCE, SA ;
CLARK, C ;
CHAKARIAN, V ;
SHUH, DK ;
YARMOFF, JA ;
MADEY, TE ;
NORDLANDER, P ;
MASCHHOFF, B ;
TAO, HS .
PHYSICAL REVIEW B, 1992, 45 (24) :14264-14272
[8]   KINETIC-ENERGY-ENHANCED NEUTRAL ETCHING [J].
LEONE, SR .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (4B) :2073-2082
[9]   PLASMA-DAMAGED OXIDE RELIABILITY STUDY CORRELATING BOTH HOT-CARRIER INJECTION AND TIME-DEPENDENT DIELECTRIC-BREAKDOWN [J].
LI, XY ;
HSU, JT ;
AUM, P ;
CHAN, D ;
REMBETSKI, J ;
VISWANATHAN, CR .
IEEE ELECTRON DEVICE LETTERS, 1993, 14 (02) :91-93
[10]   MECHANISM OF SURFACE CHARGING EFFECTS ON ETCHING PROFILE DEFECTS [J].
MURAKAWA, S ;
MCVITTIE, JP .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B) :2184-2188