Fast all-optical switching using ion-implanted silicon photonic crystal nanocavities

被引:138
作者
Tanabe, Takasumi
Nishiguchi, Katsuhiko
Shinya, Akihiko
Kuramochi, Eiichi
Inokawa, Hiroshi
Notomi, Masaya
Yamada, Koji
Tsuchizawa, Tai
Watanabe, Toshifumi
Fukuda, Hiroshi
Shinojima, Hiroyuki
Itabashi, Seiichi
机构
[1] NTT Corp, NTT Basic Res Labs, Kanagawa 2430198, Japan
[2] NTT Corp, NTT Microsyst Integrat Labs, Kanagawa 2430198, Japan
关键词
D O I
10.1063/1.2431767
中图分类号
O59 [应用物理学];
学科分类号
摘要
On-chip all-optical switching based on the carrier plasma dispersion in an argon ion (Ar+) implanted photonic crystal (PhC) nanocavity that is connected to input/output waveguides is described. A high dose of Ar+ is introduced, and annealing is used to recrystallize the silicon and thus create dislocation loops at the center of the PhC slab. Dislocation loops enable the fast recombination of the carriers, which allows a fast switching recovery time for PhC switches. The switching window (similar to 70 ps) is three times smaller than that without ion implantation, while the required operating energy remains almost the same (< 100 fJ). (c) 2007 American Institute of Physics.
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页数:3
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