Oxidation kinetics and mechanisms of Ti-Ta alloys

被引:24
作者
Hanrahan, RJ
Butt, DP
机构
[1] Los Alamos National Laboratory,Materials Science and Technology Division
来源
OXIDATION OF METALS | 1997年 / 47卷 / 3-4期
关键词
titanium; tantalum; titanium alloy; oxidation mechanism; oxidation kinetics;
D O I
10.1007/BF01668517
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
The oxidation kinetics of alloys containing nominally 5, 40, and 60 weight percent Ta, as well as pure Ti and Ta, were measured for 16 hr in argon-20% oxygen or pure oxygen at 800, 1000, 1200 and 1400 degrees C. These three alloys were chosen as representative of low, intermediate and high-Ta content for comparison to previous studies. In addition to TGA, specimens were examined using scanning electron microscopy, electron microprobe, and X-ray diffraction. The effect of Ta on the oxidation of Ti is explained by an increase in the compositional range of the oxygen-stabilized alpha-phase while apparently reducing the solubility of oxygen and the diffusivity of Ti in both the alpha- and beta-phases. The composition which exhibits the minimum oxidation rate varies depending on the temperature and atmosphere, but is governed by the solubility of Ta in oxygen-stabilized,alpha-Ti.
引用
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页码:317 / 353
页数:37
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