Nanoscale deep level defect correlation with Schottky barriers in 4H-SiC/metal diodes

被引:0
|
作者
Tumakha, S. [1 ]
Porter, L. M.
Ewing, D. J.
Wahab, Q.
Ma, X. Y.
Sudarshan, T. S.
Brillson, L. J.
机构
[1] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[2] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
[3] Linkoping Univ, Dept Phys & Measurement Technol, SE-58183 Linkoping, Sweden
[4] MaxMile Technol, LLC, Lexington, SC 29072 USA
[5] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
关键词
4H-SiC; Schottky contacts; inhomogeneity; nanoscale; defects; cathodoluminescence;
D O I
10.4028/www.scientific.net/MSF.527-529.907
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have used depth-resolved cathodoluminescence spectroscopy (DRCLS) to correlate subsurface deep level emissions and double barrier current-voltage (I-V) characteristics across an array of Ni/4H-SiC diodes on the same epitaxial wafer, These results demonstrate not only a correspondence between these optical features and measured barrier heights, but they also suggest that such states may limit the range of SB heights in general. DRCLS of near-ideal diodes show a broad 2.45 eV emission at common to all diode areas and associated with either impurities or inclusions. Strongly non-ideal diodes exhibit additional defect emissions at 2.2 and 2.65 eV. On the other hand, there is no correlation between the appearance of morphological defects observed by polarized light microscopy or X-ray topography and the presence of double barrier characteristics. The DRCLS observations of defect level transitions that correlate with non-ideal Schottky barriers suggest that these sub-surface defect features can be used to predict Schottky barrier behavior.
引用
收藏
页码:907 / 910
页数:4
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