Fuzzy Control for One Kind of Curing Process

被引：0
作者：
Lu XinJiang [1 ]
Li Han-Xiong [1 ]
机构：
[1] City Univ Hong Kong, Dept Mfg Eng & Eng Management, Hong Kong, Hong Kong, Peoples R China
来源：
2009 IEEE INTERNATIONAL CONFERENCE ON COMPUTATIONAL INTELLIGENCE FOR MEASUREMENT SYSTEMS AND APPLICATIONS | 2009年
关键词：
Fuzzy control; T-S model; Curing process; Process control; Robust control; TEMPERATURE UNIFORMITY; SYSTEMS; MODEL; LAMP; DESIGN;
D O I：
10.1109/CIMSA.2009.5069920
中图分类号：
TP18 [人工智能理论];
学科分类号：
081104 ; 0812 ; 0835 ; 1405 ;
摘要：
In this paper, fuzzy control is proposed to control one kind of nonlinear curing process. The nonlinear curing process is firstly approximately modeled by the T-S fuzzy model, upon which fuzzy control is designed to guarantee the process stability and achieve the H(infinity) tracking performance. Finally, the proposed method is applied to control the temperature profile of a practical curing process.
引用
收藏
页码：66 / 70
页数：5
相关论文
共 19 条
  • [1] RAPID THERMAL-PROCESSING UNIFORMITY USING MULTIVARIABLE CONTROL OF A CIRCULARLY SYMMETRICAL-3 ZONE LAMP
    APTE, PP
    SARASWAT, KC
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1992, 5 (03) : 180 - 188
  • [2] Semi-empirical model-based multivariable iterative learning control of an RTP system
    Cho, M
    Lee, Y
    Joo, S
    Lee, KS
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2005, 18 (03) : 430 - 439
  • [3] Cho YM, 1997, IEEE T CONTR SYST T, V5, P644, DOI 10.1109/87.641407
  • [4] Adaptive control approach of rapid thermal processing
    Choi, JY
    Do, HM
    Choi, HS
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2003, 16 (04) : 621 - 632
  • [5] A learning approach of wafer temperature control in a rapid thermal processing system
    Choi, JY
    Do, HM
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2001, 14 (01) : 1 - 10
  • [6] Modeling and control of distributed thermal systems
    Emami-Naeini, A
    Ebert, JL
    de Roover, D
    Kosut, RL
    Dettori, M
    Porter, LL
    Ghosal, S
    [J]. IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY, 2003, 11 (05) : 668 - 683
  • [7] A MODEL FOR RAPID THERMAL-PROCESSING - ACHIEVING UNIFORMITY THROUGH LAMP CONTROL
    GYURCSIK, RS
    RILEY, TJ
    SORRELL, FY
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1991, 4 (01) : 9 - 13
  • [8] Hisung J. C., 1997, P IEEE EL COMP TECHN, P536
  • [9] Jan YK, 1998, IEEE T SEMICONDUCT M, V11, P75, DOI 10.1109/66.661287
  • [10] Lin JH, 2001, J FOOD DRUG ANAL, V9, P1
12