Magnetostrictive Characteristics Comparison of Sm-Fe-C and Sm-Fe-N Thin Films Formed by Reactive Sputtering Process

被引：0

作者：

Shinobe, Kiyoshi ^{[1
]}

Tanakamaru, Tempei ^{[1
]}

Pazaer, Jamadil Azwad ^{[1
]}

Nabeya, Shunichi ^{[2
]}

Matsumura, Yoshihito ^{[2
]}

机构：

[1] Tokai Univ, Grad Sch Engn, Dept Appl Sci, Hiratsuka, Kanagawa 25912, Japan

[2] Dept Energy Engn, Hiratsuka, Kanagawa 25912, Japan

来源：

ACTUATOR 08, CONFERENCE PROCEEDINGS | 2008年

关键词：

Nitrogen gas; methane gas; giant magnetostriction; thin film; magnetron sputtering; internal stress;

D O I：

暂无

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

Sm-Fe thin films as giant magnetostrictive materials were prepared by d.c. magnetron sputtering process with mixed Ar-N-2 gas or Ar-CH4 gas. The maximum value of magnetostrictive susceptibility of prepared thin films was showed at 1.0 vol % of N-2 partial pressure and 0.5 vol % of CH4 partial gas pressure. In the films compressive stress was observed with a small addition of nitrogen atoms and carbon atoms into Sm-Fe thin films may lead to increase of magnetostrictive susceptibility.

引用

页码：705 / +

页数：2

共 16 条

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