Modeling of ballistic nanoscale metal-oxide-semiconductor field effect transistors

被引:23
作者
Fiori, G [1 ]
Iannaccone, G [1 ]
机构
[1] Univ Pisa, Dipartimento Ingn Informaz, I-56122 Pisa, Italy
关键词
D O I
10.1063/1.1519349
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a code for the quantum simulation of ballistic metal-oxide-semiconductor field effect transistors (MOSFETs) in two dimensions, which has been applied to the simulation of a so-called "well-tempered" MOSFET with channel length of 25 nm. Electron confinement at the Si/SiO2 interface and effective mass anisotropy are properly taken into account. In the assumption of negligible phonon scattering in nanoscale devices, transport is assumed to be purely ballistic. We show that our code can provide the relevant direct-current characteristics of the device by running on a simple high-end personal computer, and can be a useful tool for the extraction of physics-based compact models of nanoscale MOSFETs. (C) 2002 American Institute of Physics.
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页码:3672 / 3674
页数:3
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