Dielectric nonlinearity and loss in ferroelectric thin films

被引:5
作者
Xi, XX
机构
来源
LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING II | 1997年 / 2991卷
关键词
ferroelectric thin films; dielectric nonlinearity; dielectric loss; tunable microwave devices;
D O I
10.1117/12.273734
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Pulsed laser deposition has been used to deposit multilayer heterostructures consisting of high temperature superconductor (HTS) and ferroelectric layers for tunable microwave device applications. The dielectric nonlinearity and loss of the ferroelectric thin films are the key material parameters determining the performance of the tunable devices and hence the feasibility of this technology. In this paper, I will summarize the current understanding of these issues and outline the strategies to study these problems.
引用
收藏
页码:255 / 266
页数:12
相关论文
empty
未找到相关数据