Effect of film thickness and annealing temperature in stress-induced damage in metal films

被引:0
作者
Joo, Young-Chang [1 ]
Hwang, Soo-Jung [1 ]
机构
[1] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151742, South Korea
来源
THERMEC 2006, PTS 1-5 | 2007年 / 539-543卷
关键词
hillock; Al films; film thickness; annealing temperature;
D O I
10.4028/www.scientific.net/MSF.539-543.3520
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hillocks were observed in various thick Al films after annealing for a long time and their density and diameter were measured using an image analysis program. The hillock density decreased while the diameter increased with increasing film thickness. The total hillock volume per unit area of the film is linearly proportional to the film thickness and annealing temperature. Based on the results of our investigation, the effect of the film thickness, grain size and annealing temperature on hillock formation is discussed, and an equation that can be used to predict the hillock density and average hillock diameter is suggested.
引用
收藏
页码:3520 / +
页数:2
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