High-temperature electrical transport in AlxGa1-xN/GaN modulation doped field-effect transistors

被引:11
作者
Lu, Changzhi
Xie, Xuesong
Zhu, Xiudian
Wang, Dongfeng
Khan, Arif
Diagne, Ibrahima
Mohammad, S. Noor [1 ]
机构
[1] USN, Res Lab, Washington, DC 20375 USA
[2] Beijing Univ Technol, Dept Elect Informat & Control Engn, Beijing 100022, Peoples R China
[3] Electrocom Corp, Potomac, MD 20859 USA
[4] Howard Univ, Mat Sci Res Ctr Excellence, Washington, DC 20059 USA
[5] Howard Univ, Dept Elect & Comp Engn, Washington, DC 20059 USA
[6] Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA
基金
美国国家航空航天局;
关键词
ALLOYED OHMIC CONTACTS; DESIGN PRINCIPLES; ALGAN/GAN HEMTS; MICROWAVE PERFORMANCE; MECHANISMS; CHARGE;
D O I
10.1063/1.2372569
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-temperature electrical transports in AlGaN/GaN modulation doped field-effect transistors (MODFETs) grown by metal organic chemical vapor deposition method have been studied experimentally. The MODFETs have a channel length of 1.5 mu m and a gate width of 40 mu m. The influence of pinchoff voltage, gate voltage, and source-drain voltage on the electrical transports has been addressed. The role of polarization and piezoelectric effect and the fundamental physics underlying leakage have also been elucidated. The maximum drain-source current is 525 mA/mm at a gate bias of 2 V, source-drain bias of 4 V, and temperature of 300 K. The highest room temperature extrinsic transconductance is 155 mS/mm. The breakdown voltage is about 100 V at 28 and 78 degrees C. (c) 2006 American Institute of Physics.
引用
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页数:9
相关论文
共 31 条
[1]   High-frequency measurements of AlGaN/GaN HEMTs at high temperatures [J].
Akita, M ;
Kishimoto, S ;
Mizutani, T .
IEEE ELECTRON DEVICE LETTERS, 2001, 22 (08) :376-377
[2]   Microwave performance of AlGaN/GaN inverted MODFET's [J].
Aktas, O ;
Fan, ZF ;
Botchkarev, A ;
Mohammad, SN ;
Roth, M ;
Jenkins, T ;
Kehias, L ;
Morkoc, H .
IEEE ELECTRON DEVICE LETTERS, 1997, 18 (06) :293-295
[3]   High temperature characteristics of AlGaN/GaN modulation doped field-effect transistors [J].
Aktas, O ;
Fan, ZF ;
Mohammad, SN ;
Botchkarev, AE ;
Morkoc, H .
APPLIED PHYSICS LETTERS, 1996, 69 (25) :3872-3874
[4]  
Aktas O, 1995, INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST, P205, DOI 10.1109/IEDM.1995.497215
[5]   High current and transconductance AlGaN/GaN MODFETs at elevated temperatures [J].
Aktas, O ;
Fan, ZF ;
Lu, C ;
Botchkarev, A ;
Mohammad, S ;
Roth, M ;
Morkoc, H .
55TH ANNUAL DEVICE RESEARCH CONFERENCE, DIGEST - 1997, 1997, :140-141
[6]   Piezoelectric charge densities in AlGaN/GaN HFETs [J].
Asbeck, PM ;
Yu, ET ;
Lau, SS ;
Sullivan, GJ ;
VanHove, J ;
Redwing, J .
ELECTRONICS LETTERS, 1997, 33 (14) :1230-1231
[7]  
ASIFKHAN M, 2000, IEEE ELECTR DEVICE L, V21, P63
[8]  
BINARI S, 1994, UNPUB P INT S COMP S
[9]   AlGaN/GaN HEMTs grown on SiC substrates [J].
Binari, SC ;
Redwing, JM ;
Kelner, G ;
Kruppa, W .
ELECTRONICS LETTERS, 1997, 33 (03) :242-243
[10]   75 angstrom GaN channel modulation doped field effect transistors [J].
Burm, J ;
Schaff, WJ ;
Eastman, LF ;
Amano, H ;
Akasaki, I .
APPLIED PHYSICS LETTERS, 1996, 68 (20) :2849-2851