Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials

被引:37
|
作者
Volcke, C. [1 ,2 ]
Gandhiraman, R. P. [2 ]
Gubala, V. [2 ]
Raj, J. [3 ]
Cummins, Th. [2 ,4 ]
Fonder, G. [5 ]
Nooney, R. I. [2 ]
Mekhalif, Z. [5 ]
Herzog, G. [3 ]
Daniels, S. [2 ,6 ]
Arrigan, D. W. M. [3 ]
Cafolla, A. A. [2 ,4 ]
Williams, D. E. [2 ,7 ]
机构
[1] Univ Namur FUNDP, Res Ctr Phys Matter & Radiat, B-5000 Namur, Belgium
[2] Dublin City Univ, Biomed Diagnost Inst, Dublin 9, Ireland
[3] Univ Coll Cork, Tyndall Natl Inst, Biomed Diagnost Inst Programme, Cork, Ireland
[4] Dublin City Univ, Sch Phys Sci, Dublin 9, Ireland
[5] Univ Namur FUNDP, Lab Chem & Electrochem Surfaces, B-5000 Namur, Belgium
[6] Dublin City Univ, Natl Ctr Plasma Sci & Technol, Dublin 9, Ireland
[7] Univ Auckland, Dept Chem, MacDiarmid Inst Adv Mat & Nanotechnol, Auckland 1142, New Zealand
来源
BIOSENSORS & BIOELECTRONICS | 2010年 / 25卷 / 08期
基金
爱尔兰科学基金会;
关键词
Biosensors; Polymer; Plasma-enhanced chemical vapour; deposition; Nanoparticle; DNA; Immunoassay; SITE-DIRECTED IMMOBILIZATION; SELF-ASSEMBLED MONOLAYERS; PROTEIN IMMOBILIZATION; ANTIBODY FRAGMENTS; GLASS SLIDES; THIN-FILMS; SILICA; DEPOSITION; (3-AMINOPROPYL)DIMETHYLETHOXYSILANE; PEPTIDE;
D O I
10.1016/j.bios.2009.12.034
中图分类号
Q6 [生物物理学];
学科分类号
071011 ;
摘要
Here we have demonstrated a solventless plasma-based process that integrates low-cost, high throughput, high reproducibility and ecofriendly process for the functionalization of the next-generation point-of-care device platforms. Amine functionalities were deposited by plasma-enhanced chemical vapour deposition (PECVD) using a new precursor. The influence of the plasma RF power and the deposition time on surfacial properties, as well as their effect on the reactivity and content of amino groups was investigated. The key process determinants were to have a sufficient power in the plasma to activate and partially fragment the monomer but not too much as to lose the reactive amine functionality, and sufficient deposition time to develop a reactive layer but not to consume or erode the amine reactivity. An immunoassay performed using human immunoglobulin (IgG) as a model analyte showed an improvement of the detection limit by two orders of magnitude beyond that obtained using devices activated by liquid-phase reaction. (c) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1875 / 1880
页数:6
相关论文
共 50 条
  • [1] Defects in hydrogenated microcrystalline silicon prepared by plasma-enhanced chemical vapour deposition
    Morigaki, K.
    Niikura, C.
    Hikita, H.
    Yamaguchi, M.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (08)
  • [2] Silicon nitride films prepared by helicon wave plasma-enhanced chemical vapour deposition
    Yu, W
    Liu, LH
    Hou, HH
    Ding, XC
    Han, L
    Fu, GS
    ACTA PHYSICA SINICA, 2003, 52 (03) : 687 - 691
  • [3] Stress modification and characterization of thin SiC films grown by plasma-enhanced chemical vapour deposition
    Schliwinski, H.J.
    Pelka, M.
    Buchmann, L.M.
    Windbracke, W.
    Lango, P.
    Csepregi, L.
    Materials science & engineering. B, Solid-state materials for advanced technology, 1992, B11 (1-4): : 73 - 77
  • [4] CARBON MATERIALS OBTAINED BY REACTIVE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    LEVESQUE, O
    RICCI, M
    TRINQUESCOSTE, M
    DELHAES, P
    JOURNAL DE PHYSIQUE, 1989, 50 (C-5): : 269 - 279
  • [6] Plasma-enhanced chemical vapour deposition of amorphous Se films
    Nagels, P.
    Sleeckx, E.
    Callaerts, R.
    Journal De Physique, 1995, 5 (06): : 5 - 1109
  • [7] Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane
    CIEMAT, Avda. Complutense, 22, Ed. 42, E., Madrid, Spain
    Appl Surf Sci, 1 (11-15):
  • [8] The influence of Ar addition on the structure of an a-SiOCF film prepared by plasma-enhanced chemical vapour deposition
    Ding, SJ
    Wang, PF
    Zhang, DW
    Wang, JT
    Lee, WW
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (02) : 155 - 159
  • [9] Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane
    Cárabe, J
    Gandía, JJ
    González, N
    Rodríguez, A
    Gutiérrez, MT
    APPLIED SURFACE SCIENCE, 1999, 143 (1-4) : 11 - 15
  • [10] Growth of plasma-enhanced chemical vapour deposition and hot filament plasma-enhanced chemical vapour deposition transfer-free graphene using a nickel catalyst
    Othman, Maisara
    Ritikos, Richard
    Rahman, Saadah Abdul
    THIN SOLID FILMS, 2019, 685 : 335 - 342