Evolution of magnetic and structural properties from Ag nanolayers to several microns Co-Ag deposits prepared by electrodeposition

被引:18
作者
Garcia-Torres, Jose
Gomez, Elvira
Valles, Elisa [1 ]
机构
[1] Univ Barcelona, Electrodep, Dept Quim Fis, E-08028 Barcelona, Spain
关键词
Electroplating; Coercivity; Cobalt-silver thin films; Field-emission scanning electron microscopy (FE-SEM); Selected area electron diffraction-transmission electron microscopy (SAED-TEM); GIANT MAGNETORESISTANCE; FILMS; CU;
D O I
10.1016/j.jelechem.2009.08.003
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
The evolution of composition, morphology, magnetic properties and crystalline structure of Co-Ag electrodeposits from nanometric to micrometric thicknesses has been analyzed. Different substrates (Si/Ti/Ni, Si/Cr/Cu and glass/ITO) have been used to electrodeposit the Co-Ag system. The same trend was observed in all cases: after a first nanometric silver layer, cobalt was gradually incorporated till constant composition was attained. Moreover, a gradual variation of the magnetic response of the films from diamagnetism to superparamagnetism and then ferromagnetism was detected by increasing the deposition charge. fcc-Ag, hcp-Co and a metastable phase hcp-CoAg3 were present in Co-Ag micrometric deposits grown over Si/Ti/Ni from the very early deposition stages, these deposits showing coercivity values around 115 Oe. However, deposits of lower coercivities (around 50 Oe) were obtained over glass/ITO and Sill Cr/Cu substrates, these deposits being constituted by fcc-Ag and hcp-Co. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:63 / 68
页数:6
相关论文
共 16 条
[1]   GIANT MAGNETORESISTANCE IN ELECTRODEPOSITED SUPERLATTICES [J].
ALPER, M ;
ATTENBOROUGH, K ;
HART, R ;
LANE, SJ ;
LASHMORE, DS ;
YOUNES, C ;
SCHWARZACHER, W .
APPLIED PHYSICS LETTERS, 1993, 63 (15) :2144-2146
[2]   GIANT MAGNETORESISTANCE IN HETEROGENEOUS CU-CO AND AG-CO ALLOY-FILMS [J].
BERKOWITZ, AE ;
MITCHELL, JR ;
CAREY, MJ ;
YOUNG, AP ;
RAO, D ;
STARR, A ;
ZHANG, S ;
SPADA, FE ;
PARKER, FT ;
HUTTEN, A ;
THOMAS, G .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (10) :5320-5325
[3]   GIANT MAGNETORESISTANCE IN ELECTRODEPOSITED NI/CU AND CO/CU MULTILAYERS [J].
BIRD, KD ;
SCHLESINGER, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (04) :L65-L66
[4]   GIANT MAGNETORESISTANCE IN BULK MECHANICALLY ALLOYED CO-AG [J].
FAGAN, AJ ;
VIRET, M ;
COEY, JMD .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1995, 7 (47) :8953-8966
[5]   Metastable Structures of Co and Co-Ag Detected in Electrodeposited Coatings [J].
Garcia-Torres, Jose ;
Gomez, Elvira ;
Alcobe, Xavier ;
Valles, Elisa .
CRYSTAL GROWTH & DESIGN, 2009, 9 (04) :1671-1676
[6]   Annealing of electroplated Co-Cu films to induce magnetoresistance [J].
Gómez, E ;
Labarta, A ;
Llorente, A ;
Vallés, E .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (11) :C731-C736
[7]   Preparation of Co-Ag films by direct and pulse electrochemical methods [J].
Gomez, Elvira ;
Garcia-Torres, Jose ;
Valles, Elisa .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2008, 615 (02) :213-221
[8]   Electrodeposition of Co-Ag films and compositional determination by electrochemical methods [J].
Gomez, Elvira ;
Garia-Torres, Jose ;
Valles, Elisa .
ANALYTICA CHIMICA ACTA, 2007, 602 (02) :187-194
[9]  
HUGH B, 1992, ALLOY PHASE DIAGRAM, V3
[10]   Giant magnetoresistance in Co-Ag granular films prepared by electrodeposition [J].
Kenane, S ;
Chainet, E ;
Nguyen, B ;
Kadri, A ;
Benbrahim, N ;
Voiron, J .
ELECTROCHEMISTRY COMMUNICATIONS, 2002, 4 (02) :167-170