Images of dopant profiles in low-energy scanning transmission electron microscopy

被引:15
作者
Merli, PG
Corticelli, F
Morandi, V
机构
[1] CNR IMM, Sez Biol, I-40129 Bologna, Italy
[2] Univ Bologna, Dept Phys, I-40126 Bologna, Italy
[3] Univ Bologna, INFM, I-40126 Bologna, Italy
关键词
D O I
10.1063/1.1528734
中图分类号
O59 [应用物理学];
学科分类号
摘要
A scanning electron microscope is used in transmission mode. The image is formed with secondary electrons, collected by the standard detector, resulting from the conversion of transmitted electrons on a circular disk, covered with MgO smoke, located below the thinned specimen, and centered on the optical axis. Operating in this mode, bright-field images of As dopant profiles in Si, having a peak concentrations of 5 and 2.5 at. % and a spatial extension of about 40 nm, have been observed in cross sectioned specimens. The description of the dopant profiles has a resolution of 6 nm as defined by the spot size of the microscope, equipped with a LaB6 tip, and operating at 30 keV. (C) 2002 American Institute of Physics.
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收藏
页码:4535 / 4537
页数:3
相关论文
共 12 条
[1]   Dopant profiling with the scanning electron microscope - A study of Si [J].
Elliott, SL ;
Broom, RF ;
Humphreys, CJ .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (11) :9116-9122
[2]   Characterization of ultrathin doping layers in semiconductors [J].
Liu, CP ;
DuninBorkowski, RE ;
Boothroyd, CB ;
Brown, PD ;
Humphreys, CJ .
MICROSCOPY AND MICROANALYSIS, 1997, 3 (04) :352-363
[3]   Stopping and damage parameters for Monte Carlo simulation of MeV implants in crystalline Si [J].
Lulli, G ;
Albertazzi, E ;
Bianconi, M ;
Nipoti, R ;
Cervera, M ;
Camera, A ;
Cellini, C .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (12) :5958-5964
[4]   Quantitative analysis of one-dimensional dopant profile by electron holography [J].
McCartney, MR ;
Gribelyuk, MA ;
Li, J ;
Ronsheim, P ;
McMurray, JS ;
Smith, DJ .
APPLIED PHYSICS LETTERS, 2002, 80 (17) :3213-3215
[5]  
MERLI PG, IN PRESS ULTRAMICROS
[6]  
PENNYCOOK SJ, 1997, HDB MICROSCOPY, V2, P595
[7]   Two-dimensional mapping of the electrostatic potential in transistors by electron holography [J].
Rau, WD ;
Schwander, P ;
Baumann, FH ;
Höppner, W ;
Ourmazd, A .
PHYSICAL REVIEW LETTERS, 1999, 82 (12) :2614-2617
[8]  
REIMER L, 1983, TRANSMISSION ELECT M
[9]  
Reimer L., 1998, SCANNING ELECT MICRO
[10]   Mechanism for secondary electron dopant contrast in the SEM [J].
Sealy, CP ;
Castell, MR ;
Wilshaw, PR .
JOURNAL OF ELECTRON MICROSCOPY, 2000, 49 (02) :311-321