Graphene Oxide Waveguide and Micro-Ring Resonator Polarizers

被引:78
作者
Wu, Jiayang [1 ]
Yang, Yunyi [1 ,2 ]
Qu, Yang [1 ]
Xu, Xingyuan [1 ]
Liang, Yao [1 ]
Chu, Sai Tak [3 ]
Little, Brent E. [4 ]
Morandotti, Roberto [5 ,6 ,7 ]
Jia, Baohua [1 ,2 ]
Moss, David J. [1 ]
机构
[1] Swinburne Univ Technol, Ctr Microphoton, Hawthorn, Vic 3122, Australia
[2] Swinburne Univ Technol, Ctr Translat Atomat, Hawthorn, Vic 3122, Australia
[3] City Univ Hong Kong, Dept Phys & Mat Sci, 83 Tat Chee Ave, Hong Kong 999077, Peoples R China
[4] Chinese Acad Sci, State Key Lab Transient Opt & Photon, Xian Inst Opt & Precis Mech, Xian 710119, Shaanxi, Peoples R China
[5] INRS Energie Mat & Telecommun, 1650 Blvd Lionel Boulet, Varennes, PQ J3X 1S2, Canada
[6] ITMO Univ, St Petersburg 197101, Russia
[7] Univ Elect Sci & Technol China, Inst Fundamental & Frontier Sci, Chengdu 610054, Sichuan, Peoples R China
基金
加拿大自然科学与工程研究理事会; 澳大利亚研究理事会;
关键词
2D materials; graphene oxide; integrated photonics; material anisotropy; polarization control; TE-PASS POLARIZER; TRANSMISSION; EFFICIENT; COMPACT; FABRICATION;
D O I
10.1002/lpor.201900056
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Integrated waveguide polarizers and polarization-selective micro-ring resonators (MRRs) incorporated with graphene oxide (GO) films are experimentally demonstrated. CMOS-compatible doped silica waveguides and MRRs with both uniformly coated and patterned GO films are fabricated based on a large-area, transfer-free, layer-by-layer GO coating method that yields precise control of the film thickness. Photolithography and lift-off processes are used to achieve photolithographic patterning of GO films with precise control of the placement and coating length. Detailed measurements are performed to characterize the performance of the devices versus GO film thickness and coating length as a function of polarization, wavelength and power. A high polarization dependent loss of approximate to 53.8 dB is achieved for the waveguide coated with 2-mm-long patterned GO films. It is found that intrinsic film material loss anisotropy dominates the performance for less than 20 layers whereas polarization-dependent mode overlap dominates for thicker layers. For the MRRs, the GO coating length is reduced to 50 mu m, yielding a approximate to 8.3 dB polarization extinction ratio between transverse electric (TE) and transverse magnetic (TM) resonances. These results offer interesting physical insights and trends of the layered GO films and demonstrate the effectiveness of introducing GO films into photonic-integrated devices to realize high-performance polarization selective components.
引用
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页数:11
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