Effect of test conditions on electromigration reliability of Sn-Ag-Cu flip-chip solder interconnects

被引:19
作者
Lai, Yi-Shao [1 ]
Lee, Chiu-Wen [1 ]
Kao, Chin-Li [1 ]
机构
[1] Adv Semicond Engn Inc, Stress Reliabil Lab, Kaohsiung 811, Taiwan
关键词
electromig ration; solder bump; flip-chip; reliability; electrothermal coupling analysis;
D O I
10.1115/1.2429710
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The high-temperature operation life test (HTOL) was conducted in this paper to study electromigration phenomena of solder interconnects in a flip-chip package assembly. We examined the fatigue reliability and morphological patterns of three solder compositions: Sn-4Ag-0.5Cu, Sn-3.5Ag-1 Cu, and Sn-3Ag-1.5Cu, subjected to two test conditions consisting of different average current densities and ambient temperatures (5 kA/cm(2) at 150 degrees C and 20 kA/cm(2) at 30 degrees C). It is interesting to realize that as the Cu weight content of the solder composition increases, the fatigue life increases under 5 kA/cm(2) at 150 degrees C but decreases under 20 kA/cm(2) at 30 degrees C. Observed electromigration morphologies along with computed current density and temperature distributions on solder interconnects from the electrothermal coupling analysis were examined, correlated, and discussed.
引用
收藏
页码:56 / 62
页数:7
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