On the energy band of neutral-beam etched Si/Si0.7Ge0.3 nanopillars

被引:1
作者
Chuang, Min-Hui [1 ]
Li, Yiming [1 ]
Samukawa, Seiji [2 ]
机构
[1] Natl Chiao Tung Univ, Inst Commun Engn, Parallel & Sci Comp Lab, Hsinchu 300, Taiwan
[2] Tohoku Univ, Inst Fluid Sci, Sendai, Miyagi, Japan
关键词
Si nanopillar; energy band; Schrö dinger equation in k space; neutral beam etching; Si0; 7Ge0; 3; fabrication and simulation; density of state;
D O I
10.35848/1347-4065/abde2a
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, the geometry effects on the energy band of the well-aligned silicon (Si) nanopillars (NPs) embedded in Si0.7Ge0.3 matrix fabricated by neutral beam etching are studied. We formulate and solve the Schrodinger equation with an effective mass approach in k space. The radius, separation, and shape effects on the energy band and density of states of the explored NPs are calculated and discussed. The separation of NPs plays a crucial factor to manipulate the band structure among the aforementioned factors.
引用
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页数:4
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共 45 条
[1]   Visualising higher order Brillouin zones with applications [J].
Andrew, R. C. ;
Salagaram, T. ;
Chetty, N. .
EUROPEAN JOURNAL OF PHYSICS, 2017, 38 (03)
[2]   Monte Carlo simulation of thermal conductivity of Si nanowire: An investigation on the phonon confinement effect on the thermal transport [J].
Bera, Chandan .
JOURNAL OF APPLIED PHYSICS, 2012, 112 (07)
[3]   IMPROVED TETRAHEDRON METHOD FOR BRILLOUIN-ZONE INTEGRATIONS [J].
BLOCHL, PE ;
JEPSEN, O ;
ANDERSEN, OK .
PHYSICAL REVIEW B, 1994, 49 (23) :16223-16233
[4]   Fabrication and simulation of neutral-beam-etched silicon nanopillars [J].
Chuang, Min-Hui ;
Ohori, Daisuke ;
Li, Yiming ;
Chou, Kuan-Ru ;
Samukawa, Seiji .
VACUUM, 2020, 181
[5]   Fabrication of FinFETs by damage-free neutral-beam etching technology [J].
Endo, Kazuhiko ;
Noda, Shuichi ;
Masahara, Meishoku ;
Kubota, Tomohiro ;
Ozaki, Takuya ;
Samukawa, Seiji ;
Liu, Yongxun ;
Ishii, Kenichi ;
Ishikawa, Yuki ;
Sugimata, Etsuro ;
Matsukawa, Takashi ;
Takashima, Hidenori ;
Yamauchi, Hiromi ;
Suzuki, Eiichi .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (08) :1826-1833
[6]   HYPERTHERMAL NEUTRAL BEAM ETCHING [J].
GIAPIS, KP ;
MOORE, TA ;
MINTON, TK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :959-965
[7]  
Gong XG, 2008, J COMPUT MATH, V26, P310
[8]   Decreasing of the thermal conductivity of Si nanopillar/SiGe composite films investigated by using a piezoelectric photothermal spectroscopy [J].
Harada, Tomoki ;
Aki, Tsubasa ;
Ohori, Daisuke ;
Samukawa, Seiji ;
Ikari, Tetsuo ;
Fukuyama, Atsuhiko .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59
[9]   Neutral beam etching for device isolation in AlGaN/GaN HEMTs [J].
Hemmi, Fuyumi ;
Thomas, Cedric ;
Lai, Yi-Chun ;
Higo, Akio ;
Guo, Alex ;
Warnock, Shireen ;
del Alamo, Jesus A. ;
Samukawa, Seiji ;
Otsuji, Taiichi ;
Suemitsu, Tetsuya .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2017, 214 (03)
[10]   Enhanced thermoelectric performance of rough silicon nanowires [J].
Hochbaum, Allon I. ;
Chen, Renkun ;
Delgado, Raul Diaz ;
Liang, Wenjie ;
Garnett, Erik C. ;
Najarian, Mark ;
Majumdar, Arun ;
Yang, Peidong .
NATURE, 2008, 451 (7175) :163-U5