Deformation of a tensile membrane adjacent to a moving wall caused by viscous flow

被引:1
|
作者
Kashiwabara, M [1 ]
Takaki, R [1 ]
机构
[1] Tokyo Univ Agr & Technol, Tokyo 1848588, Japan
关键词
micro process; x-ray lithography; stepping motion; tensile membrane; membrane deformation; Hele-Shaw flow;
D O I
10.1016/S0169-5983(99)00032-5
中图分类号
O3 [力学];
学科分类号
08 ; 0801 ;
摘要
Theoretical analysis is done for deformation of a tensile membrane caused by viscous flow between the membrane and a solid boundary (wafer) placed adjacent to the membrane. The membrane and its support are assumed to have circular shapes. The boundary is assumed to move perpendicularly to the membrane by a small fraction of the gap width. The Hele-Shaw flow theory is applied to the flow. Variation of the central gap width is obtained, and it is shown that the maximum membrane deformation depends on the membrane tension and the final gap width. The dependence agrees with experimental results. (C) 2000 The Japan Society of Fluid Mechanics and Elsevier Science B.V. All rights reserved.
引用
收藏
页码:393 / 403
页数:11
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