The role of the configurational force balance in the nonequilibrium epitaxy of films

被引:27
作者
Fried, E
Gurtin, ME
机构
[1] Carnegie Mellon Univ, Dept Math Sci, Pittsburgh, PA 15213 USA
[2] Univ Illinois, Dept Theoret & Appl Mech, Talbot Lab 216, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
chemo-mechanical process; surface diffusion; adatom interactions; thin films; surface stress; chemical potential;
D O I
10.1016/S0022-5096(02)00077-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We discuss the epitaxial growth of an elastic film, allowing for stress and diffusion within the film surface as well as nonequilibrium interactions between the film and the vapor. Our approach, which relies on recent ideas concerning configurational forces, is based on: (i) standard (Newtonian) balance laws for forces and moments together with an independent balance law for configurational forces; (ii) atomic balances, one for each species of mobile atoms; (iii) a mechanical version of the second law that accounts for temporal changes in free energy, energy flows due to atomic transport, and power expended by both standard and configurational forces; (iv) thermodynamically consistent constitutive relations for the film surface and for the interaction between the surface and the vapor environment. The normal component of the configurational force balance at the surface represents a generalization, to a dynamical context involving dissipation, of a condition that would arise in equilibrium by considering variations of the total free energy with respect to the configuration of the film surface. Our final results consist of partial differential equations that govern the evolution of the film surface. (C) 2003 Elsevier Science Ltd. All rights reserved..
引用
收藏
页码:487 / 517
页数:31
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