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First-principles study of atomic and electronic structures of the silicon oxide clusters on Si(001) surfaces
被引:0
作者:
Chong, Yang
[1
,2
]
Chun, Yang
[1
,3
]
机构:
[1] Sichuan Normal Univ, Visual Comp & Virtual Real Key Lab Sichuan Prov, Chengdu 610068, Peoples R China
[2] Sichuan Normal Univ, Coll Phys & Elect Engn, Chengdu 610068, Peoples R China
[3] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
关键词:
Si(001) surface;
silicon oxide clusters;
density functional theory;
first-principles;
SI(100);
OXYGEN;
LAYER;
LOCALIZATION;
OXIDATION;
ENERGY;
D O I:
10.7498/aps.58.5362
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
The possible models of the silicon oxide clusters on Si(001) surface, including the regular symmetric structure (A), the periodic asymmetric structure (B), the periodic asymmetric structure (C) and the irregular structure (D), have been fully optimized using the first-principles general gradient approximation method based on density-functional theory. The results show that all the optimized surface structures are amorphous. The optimized surface structures of the B, C and D models have the similar geometric character as the tetrahedron structure of SiO2. Furthermore, the coalescence between the Si and O atoms of the silicon oxide clusters includes significant ionic bond and certain covalent bond as shown by employing the Mulliken population analysis and the graphics of electron localization function.
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页码:5362 / 5369
页数:8
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