Device technology for high-yield and high-performance InP/InGaAs DHBTs

被引:0
|
作者
Kurishima, K [1 ]
Ida, M [1 ]
Watanabe, N [1 ]
Enoki, T [1 ]
机构
[1] NTT Corp, Photon Labs, Atsugi, Kanagawa 2430198, Japan
来源
COMPOUND SEMICONDUCTORS 2001 | 2002年 / 170期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes InP double-heterojunction bipolar transistors (DHBTs) technology for 40 Gbit/s IC applications. Our DHBTs feature a carbon-doped InGaAs base and an InGaAs/InGaAsP/InP step-graded collector with its conduction-band potential profile properly controlled by a doping dipole. The fabricated transistors have current gain of 30, breakdown voltage, BVCEO, of over 8 V, and ideal collector-current turn-on behaviour up to 1 mA/mum(2). Sixty-eight transistors on a 3-inch substrate exhibit average current gain cutoff frequency,f(t), of 131 GHz and average maximum oscillation frequency,f(max), of 191 GHz with standard deviations of 1.5% and 7.9%, respectively, at current density, J(C), of 0.5 mA/mum(2) and collector voltage, V-CE, of 1.2 V.
引用
收藏
页码:51 / 56
页数:6
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