Relationship between 1/f noise parameter and Andreev reflection probability of epitaxial NbN/AlN or MgO/NbN tunnel junctions

被引:0
作者
Ishida, H
Kawakami, A
Wang, Z
Hamasaki, K
机构
[1] Nagaoka Univ Technol, Dept Engn, Nagaoka, Niigata 9402188, Japan
[2] KARC Commun Res Lab, Nishi Ku, Kobe, Hyogo 6512492, Japan
来源
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2004年 / 412卷
关键词
epitaxial NbN-based tunnel junction; 1/f noise parameter; Andreev reflection;
D O I
10.1016/j.physc.2004.01.171
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated 1/f noise properties of epitaxial NbN/AlN or MgO/NbN tunnel junctions grown on single-crystal MgO(100) substrates. The 1/f noise parameter eta for the NbN/AlN/NbN junctions greatly increased with decreasing the critical current density J(c), i.e. with increasing the barrier thickness. The result may be associated to the imperfection of epitaxial growth of the thick AlN barrier. On the other hand, for the NbN/MgO/NbN junctions the eta values did not depend on the J(c). The log eta-A (E) curve was well fitted by the following equation: log eta proportional to aA(E)(-5)/{exp(bA(E)-(1))-1}, where a and b are fitting parameters, and A (E) is Andreev reflection probability. This behavior is very interesting for the development of low noise NbN-based devices. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1459 / 1462
页数:4
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