In this study, a film of antimony selenide (Sb2Se3) was deposited on the Fluorine-doped tin oxide (FTO) as a substrate via electrodeposition at the potential of -0.55 V and the temperature of 25 degrees C. The effect of ultrasound waves during electrodeposition was also investigated at different times. The structural, morphological, optical, optoelectronic, and temperature dependence of the electrical resistance of the samples was investigated. The results showed formation of the polycrystalline phase of orthorhombic Sb2Se3. It was observed that when the ultrasound waves were used, the crystallite size (grain) and energy band gap decreased. It was found that in samples with a specified configuration, the intensity of the photocurrent decreased with increasing deposition time. Additionally, the anodic and cathodic photocurrent behaviors of the samples depended on the type and location of the electrode connection. Furthermore, the electrical resistance of the samples decreased with increasing temperature. In the sample with the lowest deposition time, conductivity and electrical activation energy were reduced by applying ultrasound waves, but they were increased by increasing the deposition time. (C) 2020 Elsevier B.V. All rights reserved.
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Im, Sang Hyuk
;
Lim, Choong-Sun
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Lim, Choong-Sun
;
Chang, Jeong Ah
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Chang, Jeong Ah
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Lee, Yong Hui
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Lee, Yong Hui
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Maiti, Nilkamal
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Maiti, Nilkamal
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Kim, Hi-Jung
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Kim, Hi-Jung
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Nazeeruddin, Md K.
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, Inst Chem Sci & Engn, CH-1050 Lausanne, SwitzerlandKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Nazeeruddin, Md K.
;
Graetzel, Michael
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, Inst Chem Sci & Engn, CH-1050 Lausanne, SwitzerlandKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Graetzel, Michael
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Seok, Sang Il
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Im, Sang Hyuk
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Lim, Choong-Sun
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Lim, Choong-Sun
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Chang, Jeong Ah
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Chang, Jeong Ah
;
Lee, Yong Hui
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Lee, Yong Hui
;
Maiti, Nilkamal
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Maiti, Nilkamal
;
Kim, Hi-Jung
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Kim, Hi-Jung
;
Nazeeruddin, Md K.
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, Inst Chem Sci & Engn, CH-1050 Lausanne, SwitzerlandKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Nazeeruddin, Md K.
;
Graetzel, Michael
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, Inst Chem Sci & Engn, CH-1050 Lausanne, SwitzerlandKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea
Graetzel, Michael
;
Seok, Sang Il
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Korea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South KoreaKorea Res Inst Chem Technol, KRICT EPFL Global Res Lab, Adv Mat Div, Taejon 305600, South Korea