Structural and optical characterization of Cu doped ZnO thin films deposited by RF magnetron sputtering

被引:7
|
作者
Toma, Maria [1 ,2 ]
Ursulean, Nicolae [1 ]
Marconi, Daniel [3 ]
Pop, Aurel [1 ]
机构
[1] Babes Bolyai Univ, Phys Fac, M Kogalniceanu 1, Cluj Napoca 400084, Romania
[2] Iuliu Hatieganu Univ Med & Pharm, Res Ctr Adv Med, Cluj Napoca 400337, Romania
[3] Natl Inst Res & Dev Isotop & Mol Technol, Dept Mol & Biomol Phys, Cluj Napoca, Romania
来源
JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS | 2019年 / 70卷 / 07期
关键词
Cu doped ZnO; thin films; RF magnetron sputtering; XRD; optical properties; GAS SENSOR; ZINC-OXIDE; AL;
D O I
10.2478/jee-2019-0054
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Cu doped transparent ZnO thin films (CZO) were sputtered on soda lime glass substrates at three different distances between substrate and target. The effects of copper doping on the structural and optical properties were investigated by X-ray diffraction (XRD) and transmittance measurements. The XRD results indicated that CZO thin films have a preferential crystallographic orientation along the hexagonal wurtzite (002) axis. With increasing the distance between substrate- target, from 4 cm to 8 cm, the refractive index of the CZO films decreased. In the visible wavelength region, the average value of the transmittance was above 80%. Thus, significant changes in the structural and optical properties have occurred due to the decrease of the distance between the target-substrate and the residual compressive stress at the film-substrate interface arising during deposition.
引用
收藏
页码:127 / 131
页数:5
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