Facile, cost-effective plasma synthesis of self-supportive FeSx on Fe foam for efficient electrochemical reduction of N2 under ambient conditions

被引:59
作者
Xiong, Wei [1 ]
Guo, Zheng [1 ]
Zhao, Shijun [2 ]
Wang, Qian [3 ]
Xu, Qiyong [3 ]
Wang, Xinwei [1 ]
机构
[1] Peking Univ, Sch Adv Mat, Shenzhen Grad Sch, Shenzhen 518055, Peoples R China
[2] City Univ Hong Kong, Dept Mech Engn, Hong Kong, Peoples R China
[3] Peking Univ, Shenzhen Grad Sch, Sch Environm & Energy, Shenzhen 518055, Peoples R China
关键词
ATOMIC LAYER DEPOSITION; AMMONIA-SYNTHESIS; NITROGEN REDUCTION; CATALYSTS; ELECTROCATALYSTS; TEMPERATURE; MECHANISM; NH3;
D O I
10.1039/c9ta07790a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electrochemical N-2 reduction reaction (NRR) in an aqueous medium has recently aroused great attention for the synthesis of NH3 under ambient conditions. However, this process generally suffers from a low NH3 production rate and often requires a noble-metal based electrocatalyst with some sophisticated nanosynthesis method. This work reports a new non-precious, self-supportive iron sulfide (FeSx) NRR electrocatalyst, synthesized by a simple H2S-plasma treatment on low-cost Fe foam. The H2S-plasma treatment sulfurizes the Fe surface to afford a self-supportive FeSx thin layer on the Fe foam (FeSx/Fe). The synthesized FeSx/Fe foam can be directly used as the electrode for the NRR, and it is demonstrated to show a remarkable NH3 production rate of 4.13 x 10(-10) mol s(-1) cm(-2) and a high faradaic efficiency of 17.6%, significantly outperforming many other reported non-precious electrocatalysts. Further material characterization shows that the surface FeSx converts to the mackinawite FeS after the NRR; the mackinawite FeS is possibly the actual high-activity NRR electrocatalyst, and density functional theory calculation is further employed to elucidate the NRR mechanism. Given the high performance and low cost, we envision that the plasma-synthesized FeSx/Fe will be of great promise for the electrochemical NH3 synthesis under ambient conditions.
引用
收藏
页码:19977 / 19983
页数:7
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