Low-frequency losses in silica glass at low temperature

被引：5

作者：

Travasso, F. ^{[1
,2
]}

Bosi, L. ^{[1
,2
]}

Dari, A. ^{[1
,2
]}

Gammaitoni, L. ^{[1
,2
]}

Vocca, H. ^{[1
,2
]}

Marchesoni, F. ^{[2
,3
]}

机构：

[1] Univ Perugia, Dipartimento Fis, I-06123 Perugia, Italy

[2] VIRGO Project, Sez Perugia, Ist Nazl Fis Nucl, I-06123 Perugia, Italy

[3] Univ Camerino, Dipartimento Fis, I-62032 Camerino, Italy

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2009年 / 521-22卷

关键词：

Internal friction; Silica glass; Glass relaxation; Asymmetric double-well model; INTERNAL-FRICTION; STRUCTURAL RELAXATION; ELASTIC PROPERTIES; RAMAN-SCATTERING;

D O I：

10.1016/j.msea.2008.09.097

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Precise low-frequency internal friction measurements on vitreous silica, taken over a wide temperature (4 K < T < 300 K) and frequency range (40 Hz < nu < 14 kHz), show remarkable similarities, but also suggestive differences with recent light-scattering experiments. In the interval 30 K < T < 110 K, the exponent alpha(T) of the power-law relaxational spectrum at low frequencies turns out to be proportional to T - T-k, with a minimum at around T-k = 13 K. This phenomenon is interpreted as a manifestation of quenched spatial disorder. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：268 / 271

页数：4

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