Metal Replacement Causing Interference in Stripping Analysis of Multiple Heavy Metal Analytes: Kinetic Study on Cd(II) and Cu(II) Electroanalysis via Experiment and Simulation

被引：59

作者：

Lin, Chu-Hong ^{[1
,2
]}

Li, Pei-Hua ^{[3
]}

Yang, Meng ^{[1
,2
]}

Ye, Jia-Jia ^{[3
]}

Huang, Xing-Jiu ^{[1
,2
,3
]}

机构：

[1] Chinese Acad Sci, Inst Intelligent Machines, Hefei 230031, Anhui, Peoples R China

[2] Chinese Acad Sci, Key Lab Environm Opt & Technol, Hefei 230031, Anhui, Peoples R China

[3] Univ Sci & Technol China, Dept Chem, Hefei 230031, Anhui, Peoples R China

来源：

ANALYTICAL CHEMISTRY | 2019年 / 91卷 / 15期

基金：

中国国家自然科学基金;

关键词：

SIMULTANEOUS ELECTROCHEMICAL DETECTION; ELECTRODE; MICROELECTRODE; VOLTAMMETRY; CADMIUM(II); ENVIRONMENT; COPPER(II); LEAD;

D O I：

10.1021/acs.analchem.9b01724

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Although it has been recognized that the interference between heavy metal ions (HMIs) becomes a severe problem for the simultaneous electroanalysis of multiple HMIs, the factor leading to the interference is still difficult to identify, due to the limited understanding of the electroanalytic kinetics. In this work, a kinetic model is built for the electroanalysis of HMIs, and the electroanalytic results are simulated for Cd(II), Cu(II), and their mixture as examples for the interference investigation. The mutual interference between Cd and Cu is observed on the glassy carbon electrode. By applying the kinetic model, the replacement of deposited Cd by Cu(II) at the codeposition stage is regarded as the main reason for the interference, and the corresponding suggestion for selecting suitable electrode materials to avoid such interference is also provided.

引用

页码：9978 / 9985

页数：8

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