A study of EWMA chart with transformed exponential data

被引:62
作者
Liu, Ji Ying
Xie, Min
Goh, Thong Ngee
Chan, L. Y.
机构
[1] Natl Univ Singapore, Dept Ind & Syst Engn, Singapore 119260, Singapore
[2] Univ Hong Kong, Dept Ind & Mfg Syst Engn, Hong Kong, Hong Kong, Peoples R China
关键词
EWMA; time-between-events; transformation; Average Run Length; exponential; Weibull;
D O I
10.1080/00207540600792598
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The exponentially weighted moving average (EWMA) chart has been shown to be effective in detecting small process shifts and predicting the process level at the next time period. In this paper, a new EWMA chart is proposed to monitor exponentially-distributed time-between-events (TBE) data. The proposed EWMA chart is set up after transforming the TBE data to approximate normal using the double square root (SQRT) transformation. The average run length (ARL) properties of an EWMA chart with transformed exponential data are investigated based on which design procedures are developed. Subsequently, the performance of the EWMA chart with transformed exponential data is compared to that of the X-MR chart, the cumulative quantity control (CQC) chart and the exponential EWMA chart. Furthermore, the robustness of the proposed EWMA chart to Weibull-distributed TBE data is examined, followed by an example to illustrate the design and application procedures. The EWMA chart with transformed exponential data performs well in monitoring exponentially-distributed TBE data.
引用
收藏
页码:743 / 763
页数:21
相关论文
共 30 条
[1]  
[Anonymous], CUMULATIVE SUM CHART
[2]  
Borror CM, 1999, J QUAL TECHNOL, V31, P309
[3]  
Borror CM, 1998, J QUAL TECHNOL, V30, P352
[4]   Robustness of the time between events CUSUM [J].
Borror, CM ;
Keats, JB ;
Montgomery, DC .
INTERNATIONAL JOURNAL OF PRODUCTION RESEARCH, 2003, 41 (15) :3435-3444
[5]  
BROOK D, 1972, BIOMETRIKA, V59, P539
[6]   A new S2-EWMA control chart for monitoring the process variance [J].
Castagliola, P .
QUALITY AND RELIABILITY ENGINEERING INTERNATIONAL, 2005, 21 (08) :781-794
[7]   Autocorrelated SPC for non-normal situations [J].
Castagliola, P ;
Tsung, F .
QUALITY AND RELIABILITY ENGINEERING INTERNATIONAL, 2005, 21 (02) :131-161
[8]   Cumulative quantity control charts for monitoring production processes [J].
Chan, LY ;
Xie, M ;
Goh, TN .
INTERNATIONAL JOURNAL OF PRODUCTION RESEARCH, 2000, 38 (02) :397-408
[9]   Age-based double EWMA controller and its application to CMP processes [J].
Chen, A ;
Guo, RS .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2001, 14 (01) :11-19
[10]   Data transformation in SPC for semiconductor machinery control: A case of monitoring particles [J].
Chen, MC ;
Su, CT ;
Hsu, CC ;
Liu, YW .
INTERNATIONAL JOURNAL OF PRODUCTION RESEARCH, 2005, 43 (13) :2759-2773