Bipolar resistance switching in high-performance Cu/ZnO : Mn/Pt nonvolatile memories: active region and influence of Joule heating
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作者:
Yang, Yu Chao
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Tsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R ChinaTsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
Yang, Yu Chao
[1
]
Pan, Feng
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Tsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R ChinaTsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
Pan, Feng
[1
]
Zeng, Fei
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Tsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R ChinaTsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
Zeng, Fei
[1
]
机构:
[1] Tsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
Manganese-doped ZnO dielectric films sandwiched between Cu and Pt electrodes were prepared and investigated for nonvolatile resistive memory applications. These structures exhibit promising bipolar resistive switching (RS) behavior with a large ON/OFF ratio (similar to 10(3)), suitable threshold voltages (1.4 and -0.7V for SET and RESET, respectively), long retention (>10(4) s at 85 degrees C) and low write current (10 mu A). A study on the ZnO : Mn thickness dependence of threshold voltages reveals that RS should be an interfacial effect rather than bulk behavior. By elevating current compliance during the SET process, an anomalous transition from bistable memory switching to monostable threshold switching was observed, which is attributed to the instability of conductive filaments induced by Joule heating effects. Apart from this, fast voltage sweep cycles without efficient heat dissipation were also found to accelerate the hard dielectric breakdown of the device, reflecting the impact of accumulative Joule heating. These results reveal the possible influences of Joule heating effects on bipolar resistance switching and thus the necessity of avoiding them in future high-density memory applications. Conceivable solutions are considered to be reducing the operating currents and improving the heat dissipation of memory devices based on our experiments.
机构:
Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Chang, S. H.
;
Chae, S. C.
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Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Chae, S. C.
;
Lee, S. B.
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Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Lee, S. B.
;
Liu, C.
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Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Liu, C.
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Noh, T. W.
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Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Noh, T. W.
;
Lee, J. S.
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机构:Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Lee, J. S.
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Kahng, B.
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机构:Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Kahng, B.
;
Jang, J. H.
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Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Jang, J. H.
;
Kim, M. Y.
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Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Kim, M. Y.
;
Kim, D. -W.
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机构:
Ewha Womans Univ, Div Nano Sci, Seoul 120750, South Korea
Ewha Womans Univ, Dept Phys, Seoul 120750, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Kim, D. -W.
;
Jung, C. U.
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Hankuk Univ Foreign Studies, Dept Phys, Yongin 449791, Gyeonggi, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, France
Univ Cambridge, Dept Mat Sci, Cambridge CB2 3QZ, EnglandUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Garcia, V.
;
Fusil, S.
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Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, France
Univ dEvry Val dEssonne, F-91025 Evry, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Fusil, S.
;
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Bouzehouane, K.
;
Enouz-Vedrenne, S.
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Thales Res & Technol, F-91767 Palaiseau, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Enouz-Vedrenne, S.
;
Mathur, N. D.
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Univ Cambridge, Dept Mat Sci, Cambridge CB2 3QZ, EnglandUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Mathur, N. D.
;
Barthelemy, A.
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机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Barthelemy, A.
;
Bibes, M.
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机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
机构:
Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Chang, S. H.
;
Chae, S. C.
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Chae, S. C.
;
Lee, S. B.
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Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Lee, S. B.
;
Liu, C.
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Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Liu, C.
;
Noh, T. W.
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机构:
Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Noh, T. W.
;
Lee, J. S.
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h-index: 0
机构:Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Lee, J. S.
;
Kahng, B.
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机构:Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Kahng, B.
;
Jang, J. H.
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h-index: 0
机构:
Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Jang, J. H.
;
Kim, M. Y.
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151747, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Kim, M. Y.
;
Kim, D. -W.
论文数: 0引用数: 0
h-index: 0
机构:
Ewha Womans Univ, Div Nano Sci, Seoul 120750, South Korea
Ewha Womans Univ, Dept Phys, Seoul 120750, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
Kim, D. -W.
;
Jung, C. U.
论文数: 0引用数: 0
h-index: 0
机构:
Hankuk Univ Foreign Studies, Dept Phys, Yongin 449791, Gyeonggi, South KoreaSeoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, France
Univ Cambridge, Dept Mat Sci, Cambridge CB2 3QZ, EnglandUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Garcia, V.
;
Fusil, S.
论文数: 0引用数: 0
h-index: 0
机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, France
Univ dEvry Val dEssonne, F-91025 Evry, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Fusil, S.
;
论文数: 引用数:
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机构:
Bouzehouane, K.
;
Enouz-Vedrenne, S.
论文数: 0引用数: 0
h-index: 0
机构:
Thales Res & Technol, F-91767 Palaiseau, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Enouz-Vedrenne, S.
;
Mathur, N. D.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Cambridge, Dept Mat Sci, Cambridge CB2 3QZ, EnglandUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Mathur, N. D.
;
Barthelemy, A.
论文数: 0引用数: 0
h-index: 0
机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Barthelemy, A.
;
Bibes, M.
论文数: 0引用数: 0
h-index: 0
机构:
Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
Univ Paris Sud, F-91405 Orsay, FranceUnite Mixte Phys CNRS Thales, F-91767 Palaiseau, France