X-RAY PHOTOELECTRON SPECTROSCOPY ANALYSIS OF ELECTRONIC STATES IN THE OXIDE LAYER ON AN ULTRADISPERSE COPPER SURFACE

被引：8

作者：

Fetisov, A. V. ^{[1
]}

Kuznetsov, M. V. ^{[2
]}

机构：

[1] Russian Acad Sci, Urals Branch, Inst Met, Ekaterinburg 620016, Russia

[2] Russian Acad Sci, Urals Branch, Inst Solid State Chem, Ekaterinburg 620016, Russia

来源：

JOURNAL OF APPLIED SPECTROSCOPY | 2009年 / 76卷 / 04期

基金：

俄罗斯基础研究基金会;

关键词：

X-ray photoelectron spectroscopy; cupric oxide; thin films; dimensional effects; LEVEL PHOTOEMISSION SPECTRA; NANOPARTICLES; SYSTEMS;

D O I：

10.1007/s10812-009-9229-4

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

X-ray photoelectron spectroscopy (XPS) is used to study the electronic states of copper oxide covering a thin (2.0 +/- 0.5 nm) layer of ultradisperse copper. A reduction in the thickness of the CuO layer is found to cause extremal behavior in the XPS spectrum parameters as opposed to their monontonic variations for CuO nanoparticles. This behavior is explained by the competition of two factors which affect the system under study: the dimensions of the substrate material and the electrostatic field in it.

引用

页码：523 / 527

页数：5

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