The 254 nm gas phase photochemistry of perfluoroacetyl chloride in the presence of O-2

被引:12
作者
Malanca, FE [1 ]
Arguello, GA [1 ]
Staricco, EH [1 ]
机构
[1] NATL UNIV CORDOBA,FAC CIENCIAS QUIM,DEPT QUIM FIS,INFIQC,RA-5016 CORDOBA,ARGENTINA
关键词
gas phase photochemistry; oxygen; perfluoroacetyl chloride;
D O I
10.1016/S1010-6030(96)04531-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The photolysis at 254 nm of perfluoroacetyl chloride (CF3COCl) in the gas phase and with O-2 in excess yielded CO2, CF2O, CF3OOOCF3, CF3COF and Cl-2 as products. It was observed that the ratio of CF3COCl consumed to Cl-2 formed was 2:1 and that the rate of disappearance of CF3COCl was faster in the presence than in the absence of O-2. The quantum yields of formation of the main products obtained in typical runs followed the relationship phi(CF3COCl) = phi(CF2O) + 2X phi(CF3OOOCF3) + phi(CF3COF) = 2X phi(Cl2) > 1 within experimental error, although individual experiments showed varying amounts of each product. From these results, we postulate that F atoms are released as a result of photolysis. Also some evidence is presented that is consistent with the formation of CF3OC(O)OyC(O)OCF3 (where y can be 2, 3 or 4) when the photo-oxidation is carried out in the presence of O-2 and CO. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:19 / 25
页数:7
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