Study of the acetylene-nitrogen, hydrogen-nitrogen and nitrogen with the addition of silicon tetrachloride, 100 kHz low pressure discharge by optical emission spectroscopy

The 100 kHz low pressure discharge in different reactive gases, i.e. acetylene-nitrogen, hydrogen-nitrogen and nitrogen, with addition silicon tetrachloride, has been studied here by means of optical emission spectroscopy. Optical emission was used to identify active plasma components: i.e. excited atoms, ions, radicals and molecules. Emission intensities of main species were monitored versus various experimental parameters, among them kind of reactive gases. The discharges were characterized by N-2(+) rotational temperature, N-2 vibrational temperature and Si I excitation temperature. The influence of the reactive gases on a decomposition process of silicon tetrachloride was investigated. Plasma processes and plasma equilibrium state were discussed.