High performance, low complexity 0.18 um SiGeBiCMOS technology for wireless circuit applications

被引:14
作者
Feilchenfeld, N [1 ]
Lanzerotti, L [1 ]
Sheridan, D [1 ]
Wuthrich, R [1 ]
Geiss, P [1 ]
Coolbaugh, D [1 ]
Gray, P [1 ]
He, J [1 ]
Demag, P [1 ]
Greco, J [1 ]
Larsen, T [1 ]
Patel, V [1 ]
Zierak, M [1 ]
Hodge, W [1 ]
Rascoe, J [1 ]
Trappasso, J [1 ]
Orner, B [1 ]
Norris, A [1 ]
Hershberger, D [1 ]
Voegeli, B [1 ]
Voldman, S [1 ]
Rassel, R [1 ]
Ramachandrian, V [1 ]
Gautsch, M [1 ]
Eshun, E [1 ]
Hussain, R [1 ]
Jordan, D [1 ]
St Onge, S [1 ]
Dunn, J [1 ]
机构
[1] IBM Corp, Microelect Div, Essex Jct, VT 05452 USA
来源
PROCEEDINGS OF THE 2002 BIPOLAR/BICMOS CIRCUITS AND TECHNOLOGY MEETING | 2002年
关键词
D O I
10.1109/BIPOL.2002.1042917
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High frequency performance at low current density and low wafer cost is essential for low power wireless BiCMOS technologies. We have developed a low-complexity, ASIC compatible, 0.18 um SiGe BiCMOS technology for wireless applications that offers 3 different breakdown voltage NPNs with the high performance device achieving F-t/F-max of 60/85 GHz with a 3.0 V BVCEO. In addition, a full suite of high performance passive devices complement the state-of-the-art SiGe wireless HBTs.
引用
收藏
页码:197 / 200
页数:4
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