Reduced hole injection barrier for achieving ultralow voltage polymer space-charge-limited transistor with a high on/off current ratio

被引:18
作者
Chao, Yu-Chiang [3 ]
Lin, Yi-Cheng [3 ]
Dai, Min-Zhi [3 ]
Zan, Hsiao-Wen [1 ,2 ]
Meng, Hsin-Fei [3 ]
机构
[1] Natl Chiao Tung Univ, Dept Photon, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 300, Taiwan
[3] Natl Chiao Tung Univ, Inst Phys, Hsinchu 300, Taiwan
关键词
ageing; organic semiconductors; plasma materials processing; polymers; transistors; INDIUM-TIN-OXIDE; WORK FUNCTION; DEPENDENCE;
D O I
10.1063/1.3261749
中图分类号
O59 [应用物理学];
学科分类号
摘要
Vertical polymer space-charge limited transistor (SCLT) operated with an ultralow voltage is demonstrated. The influence of aging effect of the oxygen plasma treated indium tin oxide electrode on the hole injection barrier and on the transistor characteristics is investigated. By reducing the hole injection barrier, the on/off ratio as high as 10(4) is obtained at a collector to emitter voltage as low as -0.84 V. The low operation voltage is crucial to the development of low-power large-area polymer transistor array. Inverter characteristics are also demonstrated by connecting a SCLT with a load resistor.
引用
收藏
页数:3
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共 14 条
[1]   High-performance solution-processed polymer space-charge-limited transistor [J].
Chao, Yu-Chiang ;
Meng, Hsin-Fei ;
Horng, Sheng-Fu ;
Hsu, Chain-Shu .
ORGANIC ELECTRONICS, 2008, 9 (03) :310-316
[2]   Polymer hot-carrier transistor with low bandgap emitter [J].
Chao, Yu-Chiang ;
Xie, Ming-Hong ;
Dai, Ming-Zhi ;
Meng, Hsin-Fei ;
Horng, Sheng-Fu ;
Hsu, Chain-Shu .
APPLIED PHYSICS LETTERS, 2008, 92 (09)
[3]   Trap-limited hole mobility in semiconducting poly(3-hexylthiophene) [J].
Chiguvare, Z ;
Dyakonov, V .
PHYSICAL REVIEW B, 2004, 70 (23) :1-8
[4]   Dependence of the molecular reorientation on the direction of incident light in azo-dye doped liquid crystals [J].
Deng, LG ;
Wang, GH ;
Zhang, JL ;
Luo, LY ;
Shao, B ;
Zhang, YH .
ICO20: DISPLAY DEVICES AND SYSTEMS, 2006, 6030
[5]   Amorphous silicon thin-film transistors with field-effect mobilities of 2 cm2/V s for electrons and 0.1 cm2/V s for holes [J].
Han, Lin ;
Mandlik, Prashant ;
Cherenack, Kunigunde H. ;
Wagner, Sigurd .
APPLIED PHYSICS LETTERS, 2009, 94 (16)
[6]   Influence of lateral crystallization on gate oxide in polycrystalline silicon thin-film transistors [J].
Kanga, Il-Suk ;
Han, Shin-Hee ;
Joo, Seung-Ki .
APPLIED PHYSICS LETTERS, 2007, 91 (22)
[7]   Characteristics of strained-Si nMOSFET using nickel silicide source/drain [J].
Kuo, C. W. ;
Wu, S. L. ;
Chang, S. J. ;
Lin, H. Y. ;
Wang, Y. P. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (08) :H611-H614
[8]   Mechanism for the increase of indium-tin-oxide work function by O2 inductively coupled plasma treatment [J].
Lee, KH ;
Jang, HW ;
Kim, KB ;
Tak, YH ;
Lee, JL .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (02) :586-590
[9]   Solution-processed poly(3-hexylthiophene) vertical organic transistor [J].
Li, Sheng-Han ;
Xu, Zheng ;
Yang, Guanwen ;
Ma, Liping ;
Yang, Yang .
APPLIED PHYSICS LETTERS, 2008, 93 (21)
[10]   Surface oxidation activates indium tin oxide for hole injection [J].
Milliron, DJ ;
Hill, IG ;
Shen, C ;
Kahn, A ;
Schwartz, J .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (01) :572-576