Commercial plasma source ion implantation facility

被引：10
|
作者：
Scheuer, JT
Walter, KC
Adler, RA
Horne, WG
机构：
[1] N STAR RES CORP,ALBUQUERQUE,NM
[2] LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87544
来源：
SURFACE & COATINGS TECHNOLOGY | 1997年 / 93卷 / 2-3期
基金：
美国能源部; 美国国家科学基金会;
关键词：
commercial applications; ion implantation; plasma source ion implantation;
D O I：
10.1016/S0257-8972(97)00043-1
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Empire Hard Chrome, in cooperation with Los Alamos National Laboratory, has recently installed commercial plasma source ion implantation (PSII) equipment built by North Star Research Corporation. The PSII system consists of a 1 x 1 m cylindrical vacuum chamber with a pulsed RF plasma source which generates plasma densities on the order of 1 x 10(10) cm(-3) while drawing only a few hundred watts of power. The high-voltage pulse modulator is capable of delivering pulses with peak voltages of 100 kV and peak currents of 300 A at maximum repetition rate of 400 Hz. The pulse modulator uses a thyratron tube to switch a purse forming network which is tailored to match the dynamic PSII load, In this paper, we discuss the PSII system and early commercial applications to production tooling. (C) 1997 Elsevier Science S.A.
引用
收藏
页码：192 / 196
页数：5
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