Fluorinated amorphous carbon as a low-dielectric constant interlayer dielectric

被引:57
作者
Endo, K
机构
关键词
D O I
10.1557/S0883769400034217
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:55 / 58
页数:4
相关论文
共 20 条
[1]   MECHANISMS OF DEPOSITION AND ETCHING OF THIN-FILMS OF PLASMA-POLYMERIZED FLUORINATED MONOMERS IN RADIOFREQUENCY DISCHARGES FED WITH C2F6-H2 AND C2F6-O2 MIXTURES [J].
DAGOSTINO, R ;
CRAMAROSSA, F ;
ILLUZZI, F .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (08) :2754-2762
[2]  
Endo K, 1996, APPL PHYS LETT, V68, P2864, DOI 10.1063/1.116350
[3]   Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics [J].
Endo, K ;
Tatsumi, T ;
Matsubara, Y .
APPLIED PHYSICS LETTERS, 1997, 70 (09) :1078-1079
[4]   FLUORINATED AMORPHOUS-CARBON THIN-FILMS GROWN BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FOR LOW DIELECTRIC-CONSTANT INTERLAYER DIELECTRICS [J].
ENDO, K ;
TATSUMI, T .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (02) :1370-1372
[5]   Effect of bias addition on the gap-filling properties of fluorinated amorphous carbon thin films grown by helicon wave plasma-enhanced chemical vapor deposition [J].
Endo, K ;
Tatsumi, T ;
Matsubara, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (10B) :L1348-L1350
[6]  
FERING AE, 1993, MACROMOLECULES, V26, P2779
[7]  
GRILL A, 1996, S H MAT RES SOC M BO
[8]   THERMAL POLYMERIZATION OF BIS(BENZOCYCLOBUTENE) MONOMERS CONTAINING ALPHA,BETA-DISUBSTITUTED ETHENES [J].
HAHN, SF ;
MARTIN, SJ ;
MCKELVY, ML ;
PATRICK, DW .
MACROMOLECULES, 1993, 26 (15) :3870-3877
[9]  
LEE WW, 1995, ADV METALL INTERCON
[10]  
Limb SJ, 1996, APPL PHYS LETT, V68, P2810, DOI 10.1063/1.116332