Nanoscale Soft Wetting Observed in Co/Sapphire during Pulsed Laser Irradiation

被引:1
作者
Choi, Jung Won [1 ,2 ]
Ham, Daseul [3 ]
Han, Seonghyun [1 ,2 ]
Noh, Do Young [1 ,2 ]
Kang, Hyon Chol [3 ]
机构
[1] Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 61005, South Korea
[2] Gwangju Inst Sci & Technol, Dept Phys & Photon Sci, Gwangju 61005, South Korea
[3] Chosun Univ, Dept Mat Sci & Engn, Gwangju 61452, South Korea
基金
新加坡国家研究基金会;
关键词
soft wetting; deformation of substrate surface; pulsed laser-induced dewetting; wetting ridge; Co thin films;
D O I
10.3390/nano11020268
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Liquid drops on deformable soft substrates exhibit quite complicated wetting behavior as compared to those on rigid solid substrates. We report on a soft wetting behavior of Co nanoparticles (NPs) on a sapphire substrate during pulsed laser-induced dewetting (PLID). Co NPs produced by PLID wetted the sapphire substrate with a contact angle near 70 degrees, which is in contrast to typical dewetting behavior of metal thin films exhibiting contact angles greater than 90 degrees. In addition, a nanoscale gamma-Al2O3 wetting ridge about 15 nm in size and a thin amorphous Al2O3 interlayer were observed around and beneath the Co NP, respectively. The observed soft wetting behavior strongly indicates that the sapphire substrate became soft and deformable during PLID. Moreover, the soft wetting was augmented under PLID in air due to the formation of a CoO shell, resulting in a smaller contact angle near 30 degrees.
引用
收藏
页码:1 / 10
页数:10
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