Structure and mechanical properties of titanium nitride, zirconium nitride, and chromium nitride films by reactive magnetron-sputter deposition

被引：0

作者：

Soe, WH

Kitagaki, T

Ueda, H

Shima, N

Otsuka, M

Yamamoto, R

机构：

来源：

INTERFACIAL ENGINEERING FOR OPTIMIZED PROPERTIES | 1997年 / 458卷

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D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

TiN, ZrN, and CrN films were grown by reactive magnetron sputtering on WC-Co sintered hard alloy substrates. Hardness and elastic modulus were measured by nano-indentation tester with low load on tip at 200 mgf. Hardness values were shown the higher value the thinner film thickness due to stress in the films.

引用

页码：379 / 384

页数：6