Partial Discharge Properties till Breakdown of Boehmite Added Enameled Twisted Pair under Bipolar Repetitive Impulse Voltage Application

被引：0

作者：

Takenouchi, Sho ^{[1
]}

Nishigaki, Yasutaka ^{[1
]}

Matsuzoe, Takakazu ^{[1
]}

Kozako, Masahiro ^{[1
]}

Hikita, Masayuki ^{[1
]}

Fujimoto, Nobutaka ^{[2
]}

Hayashizaka, Noriyuki ^{[2
]}

Kato, Toshihiko ^{[2
]}

Kikuchi, Hideyuki ^{[3
]}

机构：

[1] Kyushu Inst Technol, Fukuoka, Japan

[2] Sumitomo Seika Chem Co Ltd, Hyogo, Japan

[3] Hide Technol LLC, Ibaraki, Japan

来源：

2020 IEEE ELECTRICAL INSULATION CONFERENCE (EIC) | 2020年

关键词：

nanocomposite; boehmite alumina; partial discharge; enamel wire; life time; bipolar repetitive impulse voltage;

D O I：

10.1109/eic47619.2020.9158666

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents partial discharge (PD) degradation and life characteristics of enamel twisted pair coated with nano-boehmite (AlOOH) filler added polyimide (PI) layer under bipolar repetitive impulse voltage application for developing surge resistant winding that exceeds the conventional insulation life. An attempt is also made to compare thus obtained results with those for additive-free PI sample (PI neat). An electric circuit using a capacitance connected in series with a sample was constructed to measure PD charge till breakdown (BD). Experimental results revealed the time to breakdown of boehmite/PI extended over that of PI neat, while the average PD charge increased with time and then dropped after the peak, leading to BD. This result was interpreted by the erosion suppression effect of the boehmite filler accumulating on the layer surface due to PD degradation.

引用

页码：409 / 411

页数：3

共 6 条

[1] Kikuchi H., 2006, Transactions of the Institute of Electrical Engineers of Japan, Part B, V126-B, P460, DOI 10.1541/ieejpes.126.460
[2] Kikuchi H., 2012, T IEE JAPAN D, V132, P263
[3] Matsuzoe T., 2019, 19111 DEI, P23
[4] Matsuzoe T, 2019, 2019 IEEE ELECTRICAL INSULATION CONFERENCE (EIC), P83, DOI [10.1109/eic43217.2019.9046530, 10.1109/EIC43217.2019.9046530]
[5] Peng X., 2014, 2014 ANN M RECORD I, V1-051, P71
[6] Sumi Y., 2013, 44 S ELECT ELECT INS, VB-1, P55

← 1 →