Sources of phase error and design considerations for silicon-based monolithic high-pass/low-pass microwave phase shifters

被引:62
作者
Morton, Matthew A. [1 ]
Comeau, Jonathan P.
Cressler, John D.
Mitchell, Mark
Papapolymerou, John
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] Georgia Tech Res Inst, Atlanta, GA 30332 USA
关键词
microwave; monolithic microwave integrated circuit (MMIC) phase shifters; phase shifters; phased arrays; silicon germanium;
D O I
10.1109/TMTT.2006.886162
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A comprehensive analysis of error sources in monolithic microwave phase shifters due to device size limitations, inductor parasitics, loading effects, and nonideal switches is presented. Each component utilized in the implementation of a monolithic high-pass/low-pass phase shifter is analyzed, and its influence on phase behavior is shown in detail, with an emphasis on the net impact on absolute phase variation. The design of the individual phase-shifter filter sections and the influence of bit ordering on overall performance are also addressed. An X-band 5-bit phase shifter fabricated in a 200-GHz SiGe HBT BiCMOS technology platform is used to validate this analysis and our design methodology and achieves an absolute rms phase error of 4 degrees and relative rms phase error of 3 degrees for operation from 8.5 to 10.5 GHz.
引用
收藏
页码:4032 / 4040
页数:9
相关论文
共 13 条
  • [1] CLARK G, 2005, P GOMACTECH 05 APR, P131
  • [2] COMEAU J, 2006, IEEE MTTS INT MICR S
  • [3] BROAD-BAND DIODE PHASE SHIFTERS
    GARVER, RV
    [J]. IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1972, MT20 (05) : 314 - &
  • [4] A 12-GHz SiGe phase shifter with integrated LNA
    Hancock, TM
    Rebeiz, GM
    [J]. IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 2005, 53 (03) : 977 - 983
  • [5] Very low-loss distributed X-band and Ka-band MEMS phase shifters using metal-air-metal capacitors
    Hayden, JS
    Rebeiz, GA
    [J]. IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 2003, 51 (01) : 309 - 314
  • [6] A high-pass/lowpass phase shifter with resistive matching networks
    Iyama, Y
    Iida, A
    Ishida, O
    Urasaki, S
    Andoh, N
    [J]. ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS, 1996, 79 (02): : 44 - 54
  • [7] Self-aligned SiGeNPN transistors with 285 GHz fMAX and 207 GHz fT in a manufacturable technology
    Jagannathan, B
    Khater, M
    Pagette, F
    Rieh, JS
    Angell, D
    Chen, H
    Florkey, J
    Golan, F
    Greenberg, DR
    Groves, R
    Jeng, SJ
    Johnson, J
    Mengistu, E
    Schonenberg, KT
    Schnabel, CM
    Smith, P
    Stricker, A
    Ahlgren, D
    Freeman, G
    Stein, K
    Subbanna, S
    [J]. IEEE ELECTRON DEVICE LETTERS, 2002, 23 (05) : 258 - 260
  • [8] Organic "wafer-scale" packaged miniature 4-bit RF MEMS phase shifter
    Kingsley, N
    Papapolymerou, J
    [J]. IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 2006, 54 (03) : 1229 - 1236
  • [9] X-band RF MEMS phase shifters for phased array applications
    Malczewski, A
    Eshelman, S
    Pillans, B
    Ehmke, J
    Goldsmith, CL
    [J]. IEEE MICROWAVE AND GUIDED WAVE LETTERS, 1999, 9 (12): : 517 - 519
  • [10] OHARA M, MODELING NONIDEAL IN