Thermomechanical properties of aluminum alkoxide (alucone) films created using molecular layer deposition

被引:41
作者
Miller, David C. [1 ,3 ]
Foster, Ross R. [1 ,3 ]
Jen, Shih-Hui [2 ,3 ]
Bertrand, Jacob A. [2 ,3 ]
Seghete, Dragos [2 ,3 ]
Yoon, Byunghoon [2 ,3 ]
Lee, Yung-Cheng [1 ,3 ]
George, Steven M. [2 ,3 ]
Dunn, Martin L. [1 ,3 ]
机构
[1] Univ Colorado, Dept Mech Engn, Boulder, CO 80309 USA
[2] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA
[3] Univ Colorado, DARPA Ctr Integrated Micronanoelectromech, Boulder, CO 80309 USA
基金
美国国家科学基金会;
关键词
Thin film; Mechanical properties; Reliability; Durability; Robustness; INSTRUMENTED INDENTATION; ELASTIC-MODULUS; THIN-FILMS; BEHAVIOR; GROWTH; TEMPERATURE; HARDNESS; STRESS; CREEP;
D O I
10.1016/j.actamat.2009.07.015
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanometer-scale-thick, polymer-like coatings deposited using the molecular layer deposition (MLD) technique constitute a new class of materials. The modulus and hardness of aluminum alkoxide ("alucone") films grown using either homobifunctional or heterobifunctional reactants were measured using nanoindentation. Because the coatings are brittle and possess a significant tensile film stress immediately after deposition, the influence of film stress on the indentation measurements was quantified using a numerical analysis protocol. The film stress and coefficient of thermal expansion for alucone were determined using the wafer curvature method. Film stress was found to stabilize within the first thermal cycle, demonstrating a repeatable hysteresis thereafter. Curvature/time measurements on coated microcantilever beams indicated that the most significant evolution in film stress for alucone occurred during the initial 2 weeks of storage in the ambient environment. The temporal behavior is attributed to the change in thickness and/or modulus of alucone, and is consistent with the film stress becoming more compressive over time. An encapsulating alumina film, coated using the atomic layer deposition technique, was found to suppress the evolution of stress within alucone. The studies here suggest that the alucones have a greater elastic modulus than traditional polymers, are at present quite brittle and are prone to environmental influence. The MLD technique, however, possesses a rich wealth of options that enable the modulus, adhesion and chemical stability of the coatings to be tailored. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:5083 / 5092
页数:10
相关论文
共 50 条
[41]   Molecular Layer Deposition of Hybrid Organic-Inorganic Polymer Films using Diethylzinc and Ethylene Glycol [J].
Yoon, Byunghoon ;
O'Patchen, Jennifer L. ;
Seghete, Dragos ;
Cavanagh, Andrew S. ;
George, Steven M. .
CHEMICAL VAPOR DEPOSITION, 2009, 15 (4-6) :112-121
[42]   Metalcones: Hybrid Organic-Inorganic Films Fabricated Using Atomic and Molecular Layer Deposition Techniques [J].
George, Steven M. ;
Lee, Byoung H. ;
Yoon, Byunghoon ;
Abdulagatov, Aziz I. ;
Hall, Robert A. .
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (09) :7948-7955
[43]   Effects of pre-deposition on the optoelectronic properties of AZO films by atomic layer deposition [J].
He, Jinxing ;
Hu, Yunfei ;
Zhang, Bingliang ;
Cai, Yunhua ;
Wan, Sicheng .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2023, 34 (25)
[44]   Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing [J].
Vemuri, Vamseedhara ;
King, Sean W. ;
Lanford, William A. ;
Gaskins, John T. ;
Hopkins, Patrick Edward ;
Van Derslice, Jeremy ;
Li, Han ;
Strandwitz, Nicholas C. .
CHEMISTRY OF MATERIALS, 2023, 35 (05) :1916-1925
[45]   Thermal Atomic Layer Deposition of Aluminum-Molybdenum Oxide Films Using Trimethylaluminum, Molybdenum Dichloride Dioxide and Water [J].
Maksumova, A. M. ;
Bodalev, I. S. ;
Gadzhimuradov, S. G. ;
Abdulagatov, I. M. ;
Rabadanov, M. K. ;
Abdulagatov, A. I. .
RUSSIAN JOURNAL OF APPLIED CHEMISTRY, 2024, 97 (07) :595-607
[46]   Atomic Layer Deposition and Thermal Transformations of Aluminum-Vanadium Oxide Thin Films [J].
Abdulagatov, A., I ;
Maksumova, A. M. ;
Palchaev, D. K. ;
Rabadanov, M. Kh ;
Abdulagatov, I. M. .
RUSSIAN JOURNAL OF GENERAL CHEMISTRY, 2022, 92 (08) :1498-1510
[47]   Mechanical Properties of Atomic-Layer-Deposited Al2O3/Y2O3 Nanolaminate Films on Aluminum toward Protective Coatings [J].
Niemela, Janne-Petteri ;
Putz, Barbara ;
Mata-Osoro, Gustavo ;
Guerra-Nunez, Carlos ;
Widmer, Remo N. ;
Rohbeck, Nadia ;
Edwards, Thomas E. J. ;
Doebeli, Max ;
Mackosz, Krzysztof ;
Szkudlarek, Aleksandra ;
Kuzminykh, Yury ;
Maeder, Xavier ;
Michler, Johann ;
Andreaus, Bernhard ;
Utke, Ivo .
ACS APPLIED NANO MATERIALS, 2022, 5 (05) :6285-6296
[48]   Engineering titanium and aluminum oxide composites using atomic layer deposition [J].
Abaffy, N. Bilus ;
McCulloch, D. G. ;
Partridge, J. G. ;
Evans, P. J. ;
Triani, G. .
JOURNAL OF APPLIED PHYSICS, 2011, 110 (12)
[49]   Effect of Argon Annealing Treatment on Photoelectric Properties of GZO Films Deposited by Atomic Layer Deposition [J].
Liuyang, Junxia ;
Wang, Lei ;
He, Xinhua ;
Qiu, Tianlin ;
Ji, Xiaohong .
JOURNAL OF PHYSICAL CHEMISTRY C, 2024, 128 (09) :4086-4092
[50]   Time-Resolved Photoluminescence Properties of ZnO Thin Films Evaporated by Atomic Layer Deposition [J].
Choi, Jiung ;
Lee, Myung-Jin ;
Chae, Weon-Sik .
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2015, 15 (11) :8542-8546