Assessing the Thickness of Thin Films Based on Elemental Data Composition of Film Structures

被引：1

作者：

Nikolaenko, Yu M. ^{[1
]}

Korneevets, A. S. ^{[1
]}

Efros, N. B. ^{[1
]}

Burkhovetskii, V. V. ^{[1
]}

Reshidova, I. Yu ^{[1
]}

机构：

[1] OO Galkin Donetsk Inst Phys & Engn, UA-83114 Donetsk, Ukraine

来源：

TECHNICAL PHYSICS LETTERS | 2019年 / 45卷 / 07期

关键词：

scanning electron microscope; energy dispersive X-ray spectrometer; nanosized films; magnetron sputtering method of targets; SURFACE; GROWTH;

D O I：

10.1134/S1063785019070083

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We demonstrate the possibility of a quantitative assessment of the thickness of thin films using to measurements of the cationic composition of film structures using the INCA Energy-350 energy dispersion spectrometer that is part of the JSM-6490 LV electron microscope (Japan). The use of this method is especially useful if it is impossible to provide sufficient contrast between the images of the film and substrate sections obtained with a scanning electron microscope on a transverse cleavage of the film structure.

引用

页码：679 / 682

页数：4

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