Closed-form analytical drain current model considering energy transport and self-heating for short-channel fully-depleted SOINMOS devices with lightly-doped drain structure biased in strong inversion

被引:1
作者
Lin, SC [1 ]
Kuo, JB [1 ]
机构
[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
CMOS; compact model; SOI; VLSI;
D O I
10.1109/TED.2002.805222
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports a closed-form analytical drain current model considering energy transport and self-heating for short-channel fully-depleted (FD) SOI NMOS devices with lightly-doped drain (LDD) structure. As verified by the two-dimensional (2-D) simulation results, the analytical drain current model considering energy transport and self-heating provides an accurate prediction of the drain current behavior of the 0.25-mum FD SOI NMOS device with and without an LDD structure. From the analytical model, with the LDD structure, the device has a. smaller effective electron mobility at a low drain voltage, where lattice temperature is dominant, and a higher effective mobility at a high drain voltage, where electron temperature dominates, as compared to the non-LDD device.
引用
收藏
页码:2193 / 2203
页数:11
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