Electroless deposition of gold thin films on silicon for surface-enhanced infrared spectroelectrochemistry

被引:348
作者
Miyake, H
Ye, S
Osawa, M [1 ]
机构
[1] Hokkaido Univ, Catalysis Res Ctr, Sapporo, Hokkaido 060811, Japan
[2] Hokkaido Univ, Grad Sch Environm Earth Sci, Sapporo, Hokkaido 060811, Japan
[3] Japan Sci & Technol Corp, PRESTO, Asas, Japan
关键词
electroless deposition; gold; infrared spectroscopy; adsorption; p-nitrobenzoic acid; carbon monoxide;
D O I
10.1016/S1388-2481(02)00510-6
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Electroless (or chemical) deposition technique has been used in preparing Au island film electrodes on Si for in situ infrared spectroscopic studies of the electrochemical interface in attenuated total reflection mode. Owing to surface-enhanced infrared absorption (SEIRA) effect, absorption bands of molecules adsorbed on the chemically deposited films were one order of magnitude as large as those observed on smooth Au electrode surfaces. Although the enhancement factor was identical to that observed on vacuum evaporated Au island films, this simple method is superior to vacuum evaporation method with respect to the adhesion of the film, surface contamination, reproducibility, and cost. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:973 / 977
页数:5
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