The improvement of the oxidation resistance of TiAl alloys by fluorine plasma-based ion implantation

被引：17

作者：

Zhu, YC

Li, XY

Fujita, K

Iwamoto, N

Matsunaga, Y

Nakagawa, K

Taniguchi, S

机构：

[1] Ion Engn Res Inst Corp, Hirakata, Osaka 5730128, Japan

[2] Ishikawajima Harima Heavy Ind Co Ltd, Dept Mat Technol, Koto Ku, Tokyo 1358732, Japan

[3] Osaka Univ, Grad Sch Engn, Dept Mat Sci & Proc, Suita, Osaka 5650871, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 158卷

关键词：

fluorine; oxidation resistance; TiAl alloys; ion implantation; Al2O3;

D O I：

10.1016/S0257-8972(02)00288-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Plasma-based ion implantation (PBII) with fluorine ions has been applied for improvement of the oxidation behavior of TiAl alloys. The plasma was produced from Ar-5 vol.%F, mixed gas with a RF power supplier. 15-30 keV fluorine ions were implanted into Ti50Al (at.%) alloys for 1 h. The oxidation behavior of TiAl alloys was then investigated in air at 850 degreesC. XPS measurements revealed that prior to oxidation, fluorine ions were located in a very shallow surface region with a peak concentration, and reacted mainly with aluminum to form aluminum fluoride. TiAl treated by fluorine PBII showed a very low oxidation rate, and a protective continuous Al2O3 scale formed on the surface. The beneficial effect of fluorine on oxidation resistance of TiAl was due to that the preferentially formed volatile aluminum fluoride attributed to formation of the continuous Al2O3 scale. Fluorine PBII treatment proves to be a promising surface modification method for improving the oxidation resistance of TiAl alloys. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：503 / 507

页数：5

共 15 条

[1] MECHANISM OF ISOTHERMAL OXIDATION OF THE INTERMETALLIC TIAL AND OF TIAL ALLOYS [J].

BECKER, S ;

RAHMEL, A ;

SCHORR, M ;

SCHUTZE, M .

OXIDATION OF METALS, 1992, 38 (5-6) :425-464

[2] SHEATH THICKNESS AND POTENTIAL PROFILES OF ION-MATRIX SHEATHS FOR CYLINDRICAL AND SPHERICAL ELECTRODES [J].

CONRAD, JR .

JOURNAL OF APPLIED PHYSICS, 1987, 62 (03) :777-779

[3]

Hayes P.C., 1985, Process Selection in Extractive Metallurgy, V1st ed.

[4] Improvement of the high temperature oxidation resistance of Ti50Al via ion-implantation [J].

Hornauer, U ;

Richter, E ;

Wieser, E ;

Möller, W ;

Schumacher, G ;

Lang, C ;

Schütze, M .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 148 (1-4) :858-862

[5] POSITIVE TEMPERATURE-DEPENDENCE OF THE YIELD STRESS IN TIAL L10 TYPE SUPERLATTICE INTERMETALLIC COMPOUND SINGLE-CRYSTALS AT 293-1273-K [J].

KAWABATA, T ;

KANAI, T ;

IZUMI, O .

ACTA METALLURGICA, 1985, 33 (07) :1355-1366

[6]

KIM YW, 1994, JOM-J MIN MET MAT S, V46, P30, DOI 10.1007/BF03220745

[7] Influence of chlorine on the oxidation behavior of TiAl-Mn intermetallic compound [J].

Kumagai, M ;

Shibue, K ;

Kim, MS ;

Yonemitsu, M .

INTERMETALLICS, 1996, 4 (07) :557-566

[8] Improvement of the oxidation resistance of TiAl alloys by using the chlorine effect [J].

Schutze, M ;

Hald, M .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1997, 240 :847-858

[9] ROLE OF W, MO, NB AND SI IN OXIDATION OF TIAL IN AIR AT HIGH-TEMPERATURE [J].

SHIDA, Y ;

ANADA, H .

JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1994, 58 (07) :754-762

[10] The effect of various ternary additives on the oxidation behavior of TiAl in high-temperature air [J].

Shida, Y ;

Anada, H .

OXIDATION OF METALS, 1996, 45 (1-2) :197-219

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