Wave-optical simulation of hard-x-ray nanofocusing by precisely figured elliptical mirrors

被引:38
作者
Kewish, Cameron M. [1 ]
Assoufid, Lahsen [1 ]
Macrander, Albert T. [1 ]
Qian, Jun [1 ]
机构
[1] Argonne Natl Lab, Xray Sci Div, Argonne, IL 60439 USA
关键词
D O I
10.1364/AO.46.002010
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Computer simulations of nanofocusing by elliptical mirrors are presented wherein the diffraction and propagation of coherent hard x rays are predicted using wave-optical calculations. Surface height data acquired via microstitching interferometry were used to calculate the complex pupil function of a mirror, taking into account the Fresnel reflectivity and treating the surface topography as an aberration to a perfect elliptical mirror. The reflected wave-field amplitude and phase downstream of the mirror were obtained by numerically evaluating the Fresnel-Kirchhoff diffraction integral. Simulated intensity profiles and contours (isophotes) around the focal plane are presented for coherent illumination by a 15 keV point source, which indicate nearly diffraction-limited focusing at the 40 ran level. The effect of high spatial frequency microroughness on nanofocusing was investigated by low-pass filtering the Fourier spectrum of the residual height profile. Simulations using the filtered metrology data confirmed that roughness length scales shorter than 0.1 mm have a minor effect on the focal spot size and intensity. (c) 2007 Optical Society of America.
引用
收藏
页码:2010 / 2021
页数:12
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