A novel method for the quantitative determination of defects on graphene surfaces

被引：10
|
作者：
Yi, Hao [1 ]
Zhang, Xian [1 ]
Zhao, Yunliang [2 ]
Liu, Yanyan [3 ]
Song, Shaoxian [1 ,2 ]
机构：
[1] Wuhan Univ Technol, Sch Resources & Environm Engn, Luoshi Rd 122, Wuhan 430070, Hubei, Peoples R China
[2] Wuhan Univ Technol, Hubei Key Lab Mineral Resources Proc & Environm, Luoshi Rd 122, Wuhan 430070, Hubei, Peoples R China
[3] Wuhan Univ Technol, Hubei Prov Collaborat Innovat Ctr High Efficient, Luoshi Rd 122, Wuhan 430070, Hubei, Peoples R China
来源：
JOURNAL OF COLLOID AND INTERFACE SCIENCE | 2017年 / 499卷
基金：
中国国家自然科学基金;
关键词：
Graphene defects; Quantitative determination; Atomic force microscopy; Image processing; FILMS;
D O I：
10.1016/j.jcis.2017.03.094
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this work, a novel method for the quantitative determination of defects on graphene surfaces has been presented in order to provide accurate, reliable and quantitative information for the defects on graphene products. It was based on the selective adsorption of a specific polar organic ion (Sodium benzenesulfonate) on the edges and defects on graphene surfaces, and the atomic force microscopy (AFM) imaging of the adsorption. By means of an image processing software, the AFM images could be analyzed and the areas as well as area percentages of the defects on the graphene surfaces could be determined. (C) 2017 Elsevier Inc. All rights reserved.
引用
收藏
页码：62 / 66
页数：5
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