Standard and electrically detected magnetic resonance in nanocrystalline silicon

被引:4
作者
Bronner, W
Brüggemann, R
Mehring, M
机构
[1] Univ Stuttgart, Inst Phys 2, D-70569 Stuttgart, Germany
[2] CNRS, Lab Genie Elect Paris, F-91192 Gif Sur Yvette, France
关键词
D O I
10.1016/S0022-3093(99)00844-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present results from standard and electrically detected magnetic resonance on nanocrystalline silicon from hot-wire and plasma-enhanced chemical vapour deposition for which the Raman spectra showed the same large crystalline fraction. Based on the fact that dangling bond spin density scales with the sub-band gap absorption coefficient at photon energies < 1.1 eV we suggest the introduction of a calibration factor between the dangling bond spin density and the absorption coefficient. The photocarrier mobility-lifetime product and diffusion length increase with decreasing dangling bond spin density and absorption coefficient. The electrically detected magnetic resonance spectra shows no signal in the dark current and a single line when measured by the spin-dependent photocurrent. The experimentally determined g-value of this line is temperature dependent. The quantum-mechanical spin-pair model explains the electrically detected magnetic resonance signal height. From the spin-pair model we determine microscopic parameters, e.g. singlet-decay rate. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:534 / 539
页数:6
相关论文
共 22 条
[21]   PREPARATION OF THIN LAYERS OF GE AND SI BY CHEMICAL HYDROGEN PLASMA TRANSPORT [J].
VEPREK, S ;
MARECEK, V .
SOLID-STATE ELECTRONICS, 1968, 11 (07) :683-&
[22]  
WANKA H, 1997, P 14 EUR PHOT SOL EN, P1005