Standard and electrically detected magnetic resonance in nanocrystalline silicon

被引:4
作者
Bronner, W
Brüggemann, R
Mehring, M
机构
[1] Univ Stuttgart, Inst Phys 2, D-70569 Stuttgart, Germany
[2] CNRS, Lab Genie Elect Paris, F-91192 Gif Sur Yvette, France
关键词
D O I
10.1016/S0022-3093(99)00844-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present results from standard and electrically detected magnetic resonance on nanocrystalline silicon from hot-wire and plasma-enhanced chemical vapour deposition for which the Raman spectra showed the same large crystalline fraction. Based on the fact that dangling bond spin density scales with the sub-band gap absorption coefficient at photon energies < 1.1 eV we suggest the introduction of a calibration factor between the dangling bond spin density and the absorption coefficient. The photocarrier mobility-lifetime product and diffusion length increase with decreasing dangling bond spin density and absorption coefficient. The electrically detected magnetic resonance spectra shows no signal in the dark current and a single line when measured by the spin-dependent photocurrent. The experimentally determined g-value of this line is temperature dependent. The quantum-mechanical spin-pair model explains the electrically detected magnetic resonance signal height. From the spin-pair model we determine microscopic parameters, e.g. singlet-decay rate. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:534 / 539
页数:6
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