Counterbalanced Valve Metal Oxide as a Reliable Dielectric Layer for Electrowetting-on-dielectric Devices

被引:3
作者
Chen, Supin [1 ,4 ]
Kim, Chang-Jin CJ [1 ,2 ,3 ]
机构
[1] Univ Calif Los Angeles, Bioengn Dept, Los Angeles, CA 90095 USA
[2] Univ Calif Los Angeles, Mech & Aerosp Engn Dept, Los Angeles, CA 90095 USA
[3] Univ Calif Los Angeles, Calif NanoSyst Inst CNSI, Los Angeles, CA 90095 USA
[4] Neuralink Corp, San Francisco, CA 94107 USA
基金
美国国家科学基金会;
关键词
valve metal oxide; electrowetting; electrowetting-on-dielectric (EWOD); digital microlluidics; DIGITAL MICROFLUIDICS; SAMPLE PREPARATION; LIQUID DROPLETS; ACTUATION; FILMS; DIELECTROPHORESIS; VOLTAGE; TA2O5;
D O I
10.18494/SAM.2019.2449
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Valve metal oxide (anodized oxide) is used in a mirrored configuration to serve as self-limiting dielectric layers of electrowetting-on-dielectric (EWOD) devices. Resembling nonpolar electrolytic capacitors, the two opposing metal-dielectric layers always counterbalance each other so that voltages of any polarity can be applied without current flow. By using tantalum pentoxide as the valve metal oxide for experimental evaluation, the mirrored configuration is compared with the usual configuration and further compared with silicon oxide and silicon nitride, which are two dielectric materials commonly used for EWOD. Experiments with a range of applied biases confirm that in a mirrored configuration, one of the two metaldielectric-electrolyte combinations is always reverse-biased to prevent the current leakage, which is the most common mode of failure for the EWOD devices. The utility is demonstrated by manipulating droplets of KC1 solution on both the parallel-plate and one-plate EWOD devices.
引用
收藏
页码:2861 / 2872
页数:12
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